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Influence of film stretching on crystalline phases and dielectric properties of a 70/30 mol% poly(vinylidenefluoride-tetrafluoroethylene) copolymer

  • Polyvinylidene fluoride (PVDF)-based copolymers with tetrafluoroethylene (P(VDF-TFE)), trifluoroethylene (P(VDF-TrFE)) or hexafluoropropylene (P(VDF-HFP)) are of strong interest due to the underlying fundamental mechanisms and the potential ferro-, pyro- and piezo-electrical applications. Their flexibility and their adaptability to various shapes are advantageous in comparison to inorganic ferroelectrics. Here, we study the influence of stretching temperature on the crystalline phases and the dielectric properties in P(VDF-TFE) films by means of Dielectric Relaxation Spectroscopy (DRS), Fourier-Transform InfraRed spectroscopy (FTIR), Wide-Angle X-ray Diffraction (WAXD), Differential Scanning Calorimetry (DSC) and Dynamic Mechanical Analysis (DMA). Especially, the effect of stretching and the influence of the temperature of stretching on the mid-temperature (T-mid) transition are studied in detail. The results show that stretching has a similar effect as that on PVDF, and we observe an increase in the fraction of ferroelectricPolyvinylidene fluoride (PVDF)-based copolymers with tetrafluoroethylene (P(VDF-TFE)), trifluoroethylene (P(VDF-TrFE)) or hexafluoropropylene (P(VDF-HFP)) are of strong interest due to the underlying fundamental mechanisms and the potential ferro-, pyro- and piezo-electrical applications. Their flexibility and their adaptability to various shapes are advantageous in comparison to inorganic ferroelectrics. Here, we study the influence of stretching temperature on the crystalline phases and the dielectric properties in P(VDF-TFE) films by means of Dielectric Relaxation Spectroscopy (DRS), Fourier-Transform InfraRed spectroscopy (FTIR), Wide-Angle X-ray Diffraction (WAXD), Differential Scanning Calorimetry (DSC) and Dynamic Mechanical Analysis (DMA). Especially, the effect of stretching and the influence of the temperature of stretching on the mid-temperature (T-mid) transition are studied in detail. The results show that stretching has a similar effect as that on PVDF, and we observe an increase in the fraction of ferroelectric beta-phase with a simultaneous increment in both melting point (T-m) and crystallinity (chi(c)) of the copolymer. While an increase in the stretching temperature does not have a profound impact on the amount of ferroelectric phase, the stability of the ferroelectric phase seems to improve - as seen in the reduction of the Full Width at Half Maximum (FWHM) of the WAXD peaks in both parallel and perpendicular directions to the molecular chain axis. The observation is also supported by the reduction of dissipation losses with an increase in stretching temperature - as seen in DRS measurements. Finally, both stretching itself and the temperature of stretching affect the various molecular processes taking place in the temperature range of the T-mid transition.zeige mehrzeige weniger

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Metadaten
Verfasserangaben:Thulasinath Raman VenkatesanORCiDGND, Anna A. GulyakovaORCiD, Reimund GerhardORCiDGND
DOI:https://doi.org/10.1142/S2010135X2050023X
ISSN:2010-135X
ISSN:2010-1368
Titel des übergeordneten Werks (Englisch):Journal of advanced dielectrics
Verlag:World Scientific
Verlagsort:Singapore
Publikationstyp:Wissenschaftlicher Artikel
Sprache:Englisch
Datum der Erstveröffentlichung:10.10.2020
Erscheinungsjahr:2020
Datum der Freischaltung:04.10.2022
Freies Schlagwort / Tag:P(VDF-TFE) copolymer; crystalline phases; dielectric properties; film; mid-temperature transition; stretching
Band:10
Ausgabe:5
Aufsatznummer:2050023
Seitenanzahl:10
Fördernde Institution:German Academic Exchange Service (DAAD)Deutscher Akademischer Austausch; Dienst (DAAD)
Organisationseinheiten:Mathematisch-Naturwissenschaftliche Fakultät / Institut für Physik und Astronomie
DDC-Klassifikation:5 Naturwissenschaften und Mathematik / 52 Astronomie / 520 Astronomie und zugeordnete Wissenschaften
Peer Review:Referiert
Publikationsweg:Open Access / Gold Open-Access
Lizenz (Deutsch):License LogoCC-BY - Namensnennung 4.0 International
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