Solid-phase microcontact printing for precise patterning of rough surfaces
- We present a microcontact printing (mu CP) routine suitable to introduce defined (sub-) microscale patterns on surface substrates exhibiting a high capillary activity and receptive to a silane-based chemistry. This is achieved by transferring functional trivalent alkoxysilanes, such as (3-aminopropyl)-triethoxysilane (APTES) as a low-molecular weight ink via reversible covalent attachment to polymer brushes grafted from elastomeric polydimethylsiloxane (PDMS) stamps. The brushes consist of poly{N-[tris(hydroxymethyl)-methyl]acrylamide} (PTrisAAm) synthesized by reversible addition-fragmentation chain-transfer (RAFT)-polymerization and used for immobilization of the alkoxysilane-based ink by substituting the alkoxy moieties with polymer-bound hydroxyl groups. Upon physical contact of the silane-carrying polymers with surfaces, the conjugated silane transfers to the substrate, thus completely suppressing ink-flow and, in turn, maximizing printing accuracy even for otherwise not addressable substrate topographies. We provide a conciselyWe present a microcontact printing (mu CP) routine suitable to introduce defined (sub-) microscale patterns on surface substrates exhibiting a high capillary activity and receptive to a silane-based chemistry. This is achieved by transferring functional trivalent alkoxysilanes, such as (3-aminopropyl)-triethoxysilane (APTES) as a low-molecular weight ink via reversible covalent attachment to polymer brushes grafted from elastomeric polydimethylsiloxane (PDMS) stamps. The brushes consist of poly{N-[tris(hydroxymethyl)-methyl]acrylamide} (PTrisAAm) synthesized by reversible addition-fragmentation chain-transfer (RAFT)-polymerization and used for immobilization of the alkoxysilane-based ink by substituting the alkoxy moieties with polymer-bound hydroxyl groups. Upon physical contact of the silane-carrying polymers with surfaces, the conjugated silane transfers to the substrate, thus completely suppressing ink-flow and, in turn, maximizing printing accuracy even for otherwise not addressable substrate topographies. We provide a concisely conducted investigation on polymer brush formation using atomic force microscopy (AFM) and ellipsometry as well as ink immobilization utilizing two-dimensional proton nuclear Overhauser enhancement spectroscopy (H-1-H-1-NOESY-NMR). We analyze the mu CP process by printing onto Si-wafers and show how even distinctively rough surfaces can be addressed, which otherwise represent particularly challenging substrates.…
Verfasserangaben: | Pinar Akarsu, Richard Grobe, Julius Nowaczyk, Matthias HartliebORCiDGND, Stefan ReinickeORCiD, Alexander BökerORCiDGND, Marcel SperlingGND, Martin ReifarthORCiDGND |
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DOI: | https://doi.org/10.1021/acsapm.1c00024 |
ISSN: | 2637-6105 |
Pubmed ID: | https://pubmed.ncbi.nlm.nih.gov/34056615 |
Titel des übergeordneten Werks (Englisch): | ACS applied polymer materials |
Untertitel (Englisch): | using polymer-tethered elastomeric stamps for the transfer of reactive silanes |
Verlag: | American Chemical Society |
Verlagsort: | Washington |
Publikationstyp: | Wissenschaftlicher Artikel |
Sprache: | Englisch |
Datum der Erstveröffentlichung: | 07.04.2021 |
Erscheinungsjahr: | 2021 |
Datum der Freischaltung: | 10.01.2024 |
Freies Schlagwort / Tag: | PDMS surface grafting; capillary-active substrates; microcontact printing; shuttled RAFT-polymerization; silane chemistry; surface patterning |
Band: | 3 |
Ausgabe: | 5 |
Seitenanzahl: | 12 |
Erste Seite: | 2420 |
Letzte Seite: | 2431 |
Fördernde Institution: | European Research Council (ERC)European Research Council (ERC)European Commission [648365]; DFG (Emmy-Noether-Program)German Research Foundation (DFG) [HA 7725/2-1]; University of Potsdam |
Organisationseinheiten: | Mathematisch-Naturwissenschaftliche Fakultät / Institut für Chemie |
DDC-Klassifikation: | 5 Naturwissenschaften und Mathematik / 54 Chemie / 540 Chemie und zugeordnete Wissenschaften |
Peer Review: | Referiert |
Publikationsweg: | Open Access / Hybrid Open-Access |
Lizenz (Deutsch): | CC-BY-NC-ND - Namensnennung, nicht kommerziell, keine Bearbeitungen 4.0 International |