- search hit 1 of 1
Solid-phase microcontact printing for precise patterning of rough surfaces
- We present a microcontact printing (mu CP) routine suitable to introduce defined (sub-) microscale patterns on surface substrates exhibiting a high capillary activity and receptive to a silane-based chemistry. This is achieved by transferring functional trivalent alkoxysilanes, such as (3-aminopropyl)-triethoxysilane (APTES) as a low-molecular weight ink via reversible covalent attachment to polymer brushes grafted from elastomeric polydimethylsiloxane (PDMS) stamps. The brushes consist of poly{N-[tris(hydroxymethyl)-methyl]acrylamide} (PTrisAAm) synthesized by reversible addition-fragmentation chain-transfer (RAFT)-polymerization and used for immobilization of the alkoxysilane-based ink by substituting the alkoxy moieties with polymer-bound hydroxyl groups. Upon physical contact of the silane-carrying polymers with surfaces, the conjugated silane transfers to the substrate, thus completely suppressing ink-flow and, in turn, maximizing printing accuracy even for otherwise not addressable substrate topographies. We provide a conciselyWe present a microcontact printing (mu CP) routine suitable to introduce defined (sub-) microscale patterns on surface substrates exhibiting a high capillary activity and receptive to a silane-based chemistry. This is achieved by transferring functional trivalent alkoxysilanes, such as (3-aminopropyl)-triethoxysilane (APTES) as a low-molecular weight ink via reversible covalent attachment to polymer brushes grafted from elastomeric polydimethylsiloxane (PDMS) stamps. The brushes consist of poly{N-[tris(hydroxymethyl)-methyl]acrylamide} (PTrisAAm) synthesized by reversible addition-fragmentation chain-transfer (RAFT)-polymerization and used for immobilization of the alkoxysilane-based ink by substituting the alkoxy moieties with polymer-bound hydroxyl groups. Upon physical contact of the silane-carrying polymers with surfaces, the conjugated silane transfers to the substrate, thus completely suppressing ink-flow and, in turn, maximizing printing accuracy even for otherwise not addressable substrate topographies. We provide a concisely conducted investigation on polymer brush formation using atomic force microscopy (AFM) and ellipsometry as well as ink immobilization utilizing two-dimensional proton nuclear Overhauser enhancement spectroscopy (H-1-H-1-NOESY-NMR). We analyze the mu CP process by printing onto Si-wafers and show how even distinctively rough surfaces can be addressed, which otherwise represent particularly challenging substrates.…
Author details: | Pinar Akarsu, Richard Grobe, Julius Nowaczyk, Matthias HartliebORCiDGND, Stefan ReinickeORCiD, Alexander BökerORCiDGND, Marcel SperlingGND, Martin ReifarthORCiDGND |
---|---|
DOI: | https://doi.org/10.1021/acsapm.1c00024 |
ISSN: | 2637-6105 |
Pubmed ID: | https://pubmed.ncbi.nlm.nih.gov/34056615 |
Title of parent work (English): | ACS applied polymer materials |
Subtitle (English): | using polymer-tethered elastomeric stamps for the transfer of reactive silanes |
Publisher: | American Chemical Society |
Place of publishing: | Washington |
Publication type: | Article |
Language: | English |
Date of first publication: | 2021/04/07 |
Publication year: | 2021 |
Release date: | 2024/01/10 |
Tag: | PDMS surface grafting; capillary-active substrates; microcontact printing; shuttled RAFT-polymerization; silane chemistry; surface patterning |
Volume: | 3 |
Issue: | 5 |
Number of pages: | 12 |
First page: | 2420 |
Last Page: | 2431 |
Funding institution: | European Research Council (ERC)European Research Council (ERC)European Commission [648365]; DFG (Emmy-Noether-Program)German Research Foundation (DFG) [HA 7725/2-1]; University of Potsdam |
Organizational units: | Mathematisch-Naturwissenschaftliche Fakultät / Institut für Chemie |
DDC classification: | 5 Naturwissenschaften und Mathematik / 54 Chemie / 540 Chemie und zugeordnete Wissenschaften |
Peer review: | Referiert |
Publishing method: | Open Access / Hybrid Open-Access |
License (German): | CC-BY-NC-ND - Namensnennung, nicht kommerziell, keine Bearbeitungen 4.0 International |