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Crystallize It before It diffuses

  • Numerous phosphorus-rich metal phosphides containing both P-P bonds and metal-P bonds are known from the solid-state chemistry literature. A method to grow these materials in thin-film form would be desirable, as thin films are required in many applications and they are an ideal platform for high-throughput studies. In addition, the high density and smooth surfaces achievable in thin films are a significant advantage for characterization of transport and optical properties. Despite these benefits, there is hardly any published work on even the simplest binary phosphorus-rich phosphide films. Here, we demonstrate growth of single-phase CuP2 films by a two-step process involving reactive sputtering of amorphous CuP2+x and rapid annealing in an inert atmosphere. At the crystallization temperature, CuP2 is thermodynamically unstable with respect to Cu3P and P-4. However, CuP2 can be stabilized if the amorphous precursors are mixed on the atomic scale and are sufficiently close to the desired composition (neither too P poor nor too PNumerous phosphorus-rich metal phosphides containing both P-P bonds and metal-P bonds are known from the solid-state chemistry literature. A method to grow these materials in thin-film form would be desirable, as thin films are required in many applications and they are an ideal platform for high-throughput studies. In addition, the high density and smooth surfaces achievable in thin films are a significant advantage for characterization of transport and optical properties. Despite these benefits, there is hardly any published work on even the simplest binary phosphorus-rich phosphide films. Here, we demonstrate growth of single-phase CuP2 films by a two-step process involving reactive sputtering of amorphous CuP2+x and rapid annealing in an inert atmosphere. At the crystallization temperature, CuP2 is thermodynamically unstable with respect to Cu3P and P-4. However, CuP2 can be stabilized if the amorphous precursors are mixed on the atomic scale and are sufficiently close to the desired composition (neither too P poor nor too P rich). Fast formation of polycrystalline CuP2, combined with a short annealing time, makes it possible to bypass the diffusion processes responsible for decomposition. We find that thin-film CuP2 is a 1.5 eV band gap semiconductor with interesting properties, such as a high optical absorption coefficient (above 10(5) cm(-1)), low thermal conductivity (1.1 W/(K m)), and composition-insensitive electrical conductivity (around 1 S/cm). We anticipate that our processing route can be extended to other phosphorus-rich phosphides that are still awaiting thin-film synthesis and will lead to a more complete understanding of these materials and of their potential applications.show moreshow less

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Author details:Andrea CrovettoORCiD, Danny KojdaORCiD, Feng YiORCiD, Karen N. HeinselmanORCiD, David A. LaVan, Klaus HabichtORCiDGND, Thomas UnoldORCiD, Andriy ZakutayevORCiD
DOI:https://doi.org/10.1021/jacs.2c04868
ISSN:0002-7863
ISSN:1520-5126
Pubmed ID:https://pubmed.ncbi.nlm.nih.gov/35822809
Title of parent work (English):Journal of the american chemical society
Subtitle (English):kinetic stabilization of thin-film phosphorus-rich semiconductor CuP2
Publisher:American Chemical Society
Place of publishing:Washington
Publication type:Article
Language:English
Date of first publication:2022/07/13
Publication year:2022
Release date:2024/05/30
Volume:144
Issue:29
Number of pages:10
First page:13334
Last Page:13343
Funding institution:European Unions Horizon 2020 research and innovation programme under the; Marie Sklodowska-Curie Grant [840751]; U.S. Department of Energy (DOE); [DE-AC36-08GO28308]; Office of Science, Office of Basic Energy Sciences;; Helmholtz Energy Materials Foundry (HEMF)
Organizational units:Mathematisch-Naturwissenschaftliche Fakultät / Institut für Chemie
DDC classification:5 Naturwissenschaften und Mathematik / 54 Chemie / 540 Chemie und zugeordnete Wissenschaften
Peer review:Referiert
Publishing method:Open Access / Hybrid Open-Access
License (German):License LogoCC-BY - Namensnennung 4.0 International
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