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Ternary nanoswitches realized with multiresponsive PMMA-b-PNIPMAM films in mixed water/acetone vapor atmospheres

  • To systematically add functionality to nanoscale polymer switches, an understanding of their responsive behavior is crucial. Herein, solvent vapor stimuli are applied to thin films of a diblock copolymer consisting of a short poly(methyl methacrylate) (PMMA) block and a long poly(N-isopropylmethacrylamide) (PNIPMAM) block for realizing ternary nanoswitches. Three significantly distinct film states are successfully implemented by the combination of amphiphilicity and co-nonsolvency effect. The exposure of the thin films to nitrogen, pure water vapor, and mixed water/acetone (90 vol%/10 vol%) vapor switches the films from a dried to a hydrated (solvated and swollen) and a water/acetone-exchanged (solvated and contracted) equilibrium state. These three states have distinctly different film thicknesses and solvent contents, which act as switch positions "off," "on," and "standby." For understanding the switching process, time-of-flight neutron reflectometry (ToF-NR) and spectral reflectance (SR) studies of the swelling and dehydrationTo systematically add functionality to nanoscale polymer switches, an understanding of their responsive behavior is crucial. Herein, solvent vapor stimuli are applied to thin films of a diblock copolymer consisting of a short poly(methyl methacrylate) (PMMA) block and a long poly(N-isopropylmethacrylamide) (PNIPMAM) block for realizing ternary nanoswitches. Three significantly distinct film states are successfully implemented by the combination of amphiphilicity and co-nonsolvency effect. The exposure of the thin films to nitrogen, pure water vapor, and mixed water/acetone (90 vol%/10 vol%) vapor switches the films from a dried to a hydrated (solvated and swollen) and a water/acetone-exchanged (solvated and contracted) equilibrium state. These three states have distinctly different film thicknesses and solvent contents, which act as switch positions "off," "on," and "standby." For understanding the switching process, time-of-flight neutron reflectometry (ToF-NR) and spectral reflectance (SR) studies of the swelling and dehydration process are complemented by information on the local solvation of functional groups probed with Fourier-transform infrared (FTIR) spectroscopy. An accelerated responsive behavior beyond a minimum hydration/solvation level is attributed to the fast build-up and depletion of the hydration shell of PNIPMAM, caused by its hydrophobic moieties promoting a cooperative hydration character.zeige mehrzeige weniger

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Metadaten
Verfasserangaben:Christina GeigerORCiDGND, Julija ReitenbachORCiDGND, Cristiane HenschelORCiDGND, Lucas KreuzerORCiDGND, Tobias WidmannORCiDGND, Peixi Wang, Gaetano Mangiapia, Jean-François Moulin, Christine M. PapadakisORCiDGND, André LaschewskyORCiDGND, Peter Müller-BuschbaumORCiDGND
DOI:https://doi.org/10.1002/adem.202100191
ISSN:1438-1656
ISSN:1527-2648
Titel des übergeordneten Werks (Englisch):Advanced engineering materials
Verlag:Wiley-VCH
Verlagsort:Weinheim
Publikationstyp:Wissenschaftlicher Artikel
Sprache:Englisch
Datum der Erstveröffentlichung:05.05.2021
Erscheinungsjahr:2021
Datum der Freischaltung:13.05.2024
Freies Schlagwort / Tag:co-nonsolvency; diblock copolymers; nanoswitches; neutron reflectometry; thin films
Band:23
Ausgabe:11
Aufsatznummer:2100191
Seitenanzahl:12
Fördernde Institution:Deutsche Forschungsgemeinschaft (DFG)German Research Foundation (DFG) [LA 611/16-1, MU 1487/29-1, PA 771/20-1]; German Ministry for Education and Research (BMBF) project "FlexiProb"Federal Ministry of Education & Research (BMBF) [05 K2016]
Organisationseinheiten:Mathematisch-Naturwissenschaftliche Fakultät / Institut für Chemie
DDC-Klassifikation:5 Naturwissenschaften und Mathematik / 54 Chemie / 540 Chemie und zugeordnete Wissenschaften
6 Technik, Medizin, angewandte Wissenschaften / 66 Chemische Verfahrenstechnik / 660 Chemische Verfahrenstechnik
Peer Review:Referiert
Publikationsweg:Open Access / Hybrid Open-Access
Lizenz (Deutsch):License LogoCC-BY-NC - Namensnennung, nicht kommerziell 4.0 International
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