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Photoswitching of azobenzene-containing self-assembled monolayers as a tool for control over silicon surface electronic properties

  • We report on photoinduced remote control of work function and surface potential of a silicon surface modified with a photosensitive self-assembled monolayer consisting of chemisorbed azobenzene molecules (4-nitroazobenzene). Itwas found that the attachment of the organic monolayer increases the work function by hundreds of meV due to the increase in the electron affinity of silicon substrates. The change in the work function on UV light illumination is more pronounced for the azobenzene jacketed silicon substrate (ca. 250 meV) in comparison to 50 meV for the unmodified surface. Moreover, the photoisomerization of azobenzene results in complex kinetics of thework function change: immediate decrease due to light-driven processes in the silicon surface followed by slower recovery to the initial state due to azobenzene isomerization. This behavior could be of interest for electronic devices where the reaction on irradiation should be more pronounced at small time scales but the overall surface potential should stay constant over timeWe report on photoinduced remote control of work function and surface potential of a silicon surface modified with a photosensitive self-assembled monolayer consisting of chemisorbed azobenzene molecules (4-nitroazobenzene). Itwas found that the attachment of the organic monolayer increases the work function by hundreds of meV due to the increase in the electron affinity of silicon substrates. The change in the work function on UV light illumination is more pronounced for the azobenzene jacketed silicon substrate (ca. 250 meV) in comparison to 50 meV for the unmodified surface. Moreover, the photoisomerization of azobenzene results in complex kinetics of thework function change: immediate decrease due to light-driven processes in the silicon surface followed by slower recovery to the initial state due to azobenzene isomerization. This behavior could be of interest for electronic devices where the reaction on irradiation should be more pronounced at small time scales but the overall surface potential should stay constant over time independent of the irradiation conditions. Published by AIP Publishing.zeige mehrzeige weniger

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Metadaten
Verfasserangaben:Ivan V. Malyar, Evgenii TitovORCiDGND, Nino Lomadze, Peter SaalfrankORCiDGND, Svetlana SanterORCiDGND
DOI:https://doi.org/10.1063/1.4978225
ISSN:0021-9606
ISSN:1089-7690
Pubmed ID:https://pubmed.ncbi.nlm.nih.gov/28298105
Titel des übergeordneten Werks (Englisch):The journal of chemical physics : bridges a gap between journals of physics and journals of chemistr
Verlag:American Institute of Physics
Verlagsort:Melville
Publikationstyp:Wissenschaftlicher Artikel
Sprache:Englisch
Datum der Erstveröffentlichung:14.03.2017
Erscheinungsjahr:2017
Datum der Freischaltung:16.06.2022
Band:146
Seitenanzahl:8
Fördernde Institution:"Fonds der Chemischen Industrie
Organisationseinheiten:Mathematisch-Naturwissenschaftliche Fakultät / Institut für Chemie
DDC-Klassifikation:5 Naturwissenschaften und Mathematik / 54 Chemie / 540 Chemie und zugeordnete Wissenschaften
Peer Review:Referiert
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