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Surface relief gratings were inscribed on azobenzene polymer films using a pulselike exposure of an Ar+ laser. The inscription process was initiated by a sequence of short pulses followed by much longer relaxation pauses. The development of the surface relief grating was probed by a He-Ne laser measuring the scattering intensity of the first- order grating peak. The growth time of the surface relief grating was found to be larger than the length of the pulses used. This unusual behavior can be considered as a nonlinear material response associated with the trans-cis isomerization of azobenzene moieties. In this study the polymer stress was assumed to be proportional to the number of cis-isomers. One-dimensional viscoelastic analysis was used to derive the polymer deformation. The rate of trans-cis isomerization increases with the intensity of the inscribing light; in the dark it is equal to the rate of thermal cis- trans isomerization. The respective relaxation times were estimated by fitting theoretical deformation curves to experimental data
Atomic force microscopy inspection of the early state of formation of polymer surface relief grating
(2001)
In this work, it is revealed how the photoinduced deformation of azobenzene containing polymers relates to the local direction of optomechanical stresses generated during irradiation with interference patterns (IPs). It can be substantiated by the modeling approach proposed by Saphiannikova et al., which describes the directional photodeformations in glassy side-chain azobenzene polymers, and proves that these deformations arise from the reorientation of rigid backbone segments along the light polarization direction. In experiments and modeling, surface relief gratings in pre-elongated photosensitive colloids of few micrometers length are inscribed using different IPs such as SS, PP, +/- 45, SP, RL, and LR. The deformation of colloidal particles is studied in situ, whereby the local variation of polymer topography is assigned to the local distribution of the electrical field vector for all IPs. Experimentally observed shapes are reproduced exactly with modeling azopolymer samples as visco-plastic bodies in the finite element software ANSYS. Orientation approach correctly predicts local variations of the main axis of light-induced stress in each interference pattern for both initially isotropic and highly oriented materials. With this work, it is suggested that the orientation approach implements a self-sufficient and convincing mechanism to describe photoinduced deformation in azopolymer films that in principle does not require auxiliary assumptions.
Thin azobenzene polymer films show a very unusual property, namely optically induced material transport. The underlying physics for this phenomenon has not yet been thoroughly explained. Nevertheless, this effect enables one to inscribe different patterns onto film surfaces, including one- and two-dimensional periodic structures. Typical sizes of such structures are of the order of micrometers, i.e. related to the interference pattern made by the laser used for optical excitation. In this study we have measured the mechanical properties of one- and two-dimensional gratings, with a high lateral resolution, using force-distance curves and pulse force mode of the atomic force microscope. We also report on the generation of considerably finer structures, with a typical size of 100 nm, which were inscribed onto the polymer surface by the tip of a scanning near-field optical microscope used as an optical pen. Such inscription not only opens new application possibilities but also gives deeper insight into the fundamentals physics underlying optically induced material transport
Surface relief gratings on azobenzene containing polymer films were prepared under irradiation by actinic light. Finite element modeling of the inscription process was carried out using linear viscoelastic analysis. It was assumed that under illumination the polymer film undergoes considerable plastification, which reduces its original Young's modulus by at least three orders of magnitude. Force densities of about 10(11) N/m(3) were necessary to reproduce the growth of the surface relief grating. It was shown that at large deformations the force of surface tension becomes comparable to the inscription force and therefore plays an essential role in the retardation of the inscription process. In addition to surface profiling the gradual development of an accompanying density grating was predicted for the regime of continuous exposure. Surface grating development under pulselike exposure cannot be explained in the frame of an incompressible fluid model. However, it was easily reproduced using the viscoelastic model with finite compressibility. (C) 2004 American Institute of Physics