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In this work, it is revealed how the photoinduced deformation of azobenzene containing polymers relates to the local direction of optomechanical stresses generated during irradiation with interference patterns (IPs). It can be substantiated by the modeling approach proposed by Saphiannikova et al., which describes the directional photodeformations in glassy side-chain azobenzene polymers, and proves that these deformations arise from the reorientation of rigid backbone segments along the light polarization direction. In experiments and modeling, surface relief gratings in pre-elongated photosensitive colloids of few micrometers length are inscribed using different IPs such as SS, PP, +/- 45, SP, RL, and LR. The deformation of colloidal particles is studied in situ, whereby the local variation of polymer topography is assigned to the local distribution of the electrical field vector for all IPs. Experimentally observed shapes are reproduced exactly with modeling azopolymer samples as visco-plastic bodies in the finite element software ANSYS. Orientation approach correctly predicts local variations of the main axis of light-induced stress in each interference pattern for both initially isotropic and highly oriented materials. With this work, it is suggested that the orientation approach implements a self-sufficient and convincing mechanism to describe photoinduced deformation in azopolymer films that in principle does not require auxiliary assumptions.
In this paper, we report on in-situ atomic force microscopy (AFM) studies of topographical changes in azobenzene-containing photosensitive polymer films that are irradiated with light interference patterns. We have developed an experimental setup consisting of an AFM combined with two-beam interferometry that permits us to switch between different polarization states of the two interfering beams while scanning the illuminated area of the polymer film, acquiring corresponding changes in topography in-situ. This way, we are able to analyze how the change in topography is related to the variation of the electrical field vector within the interference pattern. It is for the first time that with a rather simple experimental approach a rigorous assignment can be achieved. By performing in-situ measurements we found that for a certain polarization combination of two interfering beams [namely for the SP (a dagger center dot, a dagger") polarization pattern] the topography forms surface relief grating with only half the period of the interference patterns. Exploiting this phenomenon we are able to fabricate surface relief structures with characteristic features measuring only 140 nm, by using far field optics with a wavelength of 491 nm. We believe that this relatively simple method could be extremely valuable to, for instance, produce structural features below the diffraction limit at high-throughput, and this could significantly contribute to the search of new fabrication strategies in electronics and photonics industry.
We report on light-induced deformation of colloidal spheres consisting of azobenzene-containing polymers. The colloids of the size between 60 nm and 2 mu m in diameter were drop casted on a glass surface and irradiated with linearly polarized light. It was found that colloidal particles can be deformed up to ca. 6 times of their initial diameter. The maximum degree of deformation depends on the irradiation wavelength and intensity, as well as on colloidal particles size. On the basis of recently proposed theory by Toshchevikov et al. [J. Phys. Chem. Lett. 2017, 8, 1094], we calculated the optomechanical stresses (ca. 100 MPa) needed for such giant deformations and compared them with the experimental results.