Filtern
Volltext vorhanden
- nein (2)
Erscheinungsjahr
- 2019 (2) (entfernen)
Dokumenttyp
- Wissenschaftlicher Artikel (2) (entfernen)
Sprache
- Englisch (2)
Gehört zur Bibliographie
- ja (2)
Schlagworte
- SRG formation in polymer brushes (1)
- azobenzene containing surfactants (1)
- kinetic of cis-trans isomerization (1)
- photosensitive azobenzene containing surfactant (1)
- photosensitive polymer brushes (1)
- reversible and irreversible structuring of polymer brushes (1)
- strong polyelectrolyte brush (1)
- upconversion nanoparticles (1)
Institut
- Institut für Chemie (2) (entfernen)
Here we report on photo-isomerization of azobenzene containing surfactants induced during irradiation with near-infrared (NIR) light in the presence of upconversion nanoparticles (UCNPs) acting as mediator. The surfactant molecule consists of charged head group and hydrophobic tail with azobenzene group incorporated in alkyl chain. The azobenzene group can be reversible photo-isomerized between two states: trans- and cis- by irradiation with light of an appropriate wavelength. The trans-cis photo-isomerization is induced by UV light, while cis-trans isomerization proceeds either thermally in darkness, or can be accelerated by exposure to illumination with a longer wavelength typically in a blue/green range. We present the application of lanthanide doped UCNPs to successfully switch azobenzene containing surfactants from cis to trans conformation in bulk solution using NIR light. Using Tm-3(+) or Er-3(+) as activator ions, the UCNPs provide emissions in the spectral range of 450 nm < lambda(em) < 480 nm (for Tm-3(+), three and four photon induced emission) or 525 nm < lambda(em) < 545 nm (for Er-3(+), two photon induced emission), respectively. Especially for UCNPs containing Tm-3(+) a good overlap of the emissions with the absorption bands of the azobenzene is present. Under illumination of the surfactant solution with NIR light (lambda(ex) = 976 nm) in the presence of the Tm-3(+)-doped UCNPs, the relaxation time of cis-trans photo-isomerization was increased by almost 13 times compared to thermally induced isomerization. The influence of thermal heating due to the irradiation using NIR light was shown to be minor for solvents not absorbing in NIR spectral range (e.g. CHCl3) in contrast to water, which shows a distinct absorption in the NIR.
We investigate light-induced irreversible structuring of surface topographies in poly(3-sulfopropyl methacrylate/potassium salt) (PSPMK) brushes on flat solid substrates prepared by surface-initiated atom transfer radical polymerization. The brushes have been loaded with azobenzene-based surfactant comprised of positively charged headgroups and hydrophobic tail. The surfactant exhibits photoresponsive properties through photoisomerization from the trans to cis states leading to significant changes in physicochemical properties of grafted polymer chains. The azobenzene surfactant enables photoresponsive behavior without introducing irreversible changes to chemical composition of the parent polymer brush. Exposing these photosensitive brushes to irradiation with UV interference beams causes the polymer brush to form surface relief grating (SRG) patterns. The cationic surfactant penetrates only similar to 25% of the upper portion of the PSPMK brush, resulting in the formation of two sections within the brush: a photoresponsive upper layer and nonfunctional buried layer, which is not affected by the UV irradiation. Using nano-FTIR spectroscopy, we characterize locally the chemical composition of the polymer brush and confirm partial penetration of the surfactant within the film. Strong optomechanical stresses take place only within the upper layer of the brush that is impregnated with the surfactants and causes surface topography alternation due to a local rupture of grafted polymer chains. The cleaved polymer chains are then removed from the surface by using a good solvent, leaving behind topographical grating on top of the nonfunctional brush layer. We demonstrate that photostructured polymer brush can be used for reversible switching of brush topography by varying external humidity.