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In this paper, we report on the properties of nano-slits created in metal thin films using atomic force microscope (AFM) nanolithography (AFM-NL). We demonstrate that instead of expensive diamond AFM tips, it is also possible to use low cost silicon nitride tips. It is shown that depending on the direction of scratching, nano-slits of different widths and depths can be fabricated at constant load force. We elucidate the reasons for this behavior and identify an optimal direction and load force for scratching a gold layer.
We report on conductivity behavior of very thin gold layer deposited on a photosensitive polymer film. Under irradiation with light interference pattern, the azobenzene containing photosensitive polymer film undergoes deformation at which topography follows a distribution of intensity, resulting in the formation of a surface relief grating. This process is accompanied by a change in the shape of the polymer surface from flat to sinusoidal together with a corresponding increase in surface area. The gold layer placed above deforms along with the polymer and ruptures at a strain of 4%. The rupturing is spatially well defined, occurring at the topographic maxima and minima resulting in periodic cracks across the whole irradiated area. We have shown that this periodic micro-rupturing of a thin metal film has no significant impact on the electrical conductivity of the films. We suggest a model to explain this phenomenon and support this by additional experiments where the conductivity is measured in a process when a single nanoscopic scratch is formed with an AFM tip. Our results indicate that in flexible electronic materials consisting of a polymer support and an integrated metal circuit, nano-and micro cracks do not alter significantly the behavior of the conductivity unless the metal is disrupted completely. (C) 2013 AIP Publishing LLC.
We discuss the controlled subdiffraction modulations of photosensitive polymer films that are induced by surface plasmon interference in striking contrast to well-known conventional microscopic gratings. The near-field light intensity patterns were generated at the nanoslits fabricated in a silver layer with the photosensitive polymer film placed above. We observed that the topographical modulations can be excited only when the polarization is perpendicular to the nanoslits. Moreover, we have shown that light with certain wavelengths resulted in a characteristic topographical pattern with the periodicity three times smaller than the wavelength of incoming light. A combination of experimental observations with simulations showed that the unique subdiffraction topographical patterns are caused by constructive interference between two counter-propagating surface plasmon waves generated at neighboring nanoslits in the metal layer beneath the photosensitive polymer film. The light intensity distribution was simulated to demonstrate strong dependency upon the slit array periodicity as well as wavelength and polarization of incoming light.
When photosensitive azobenzene-containing polymer films are irradiated with light interference patterns, topographic variations in the film develop that follow the local distribution of the electric field vector. The exact correspondence of e.g., the vector orientation in relation to the presence of local topographic minima or maxima is in general difficult to determine. Here, we report on a systematic procedure how this can be accomplished. For this, we devise a new set-up combining an atomic force microscope and two-beam interferometry. With this set-up, it is possible to track the topography change in-situ, while at the same time changing polarization and phase of the impinging interference pattern. This is the first time that an absolute correspondence between the local distribution of electric field vectors and the local topography of the relief grating could be established exhaustively. Our setup does not require a complex mathematical post-processing and its simplicity renders it interesting for characterizing photosensitive polymer films in general.
In this paper we report on an opto-mechanical scission of polymer chains within photosensitive diblock-copolymer brushes grafted to flat solid substrates. We employ surface-initiated polymerization of methylmethacrylate (MMA) and t-butyl methacrylate (tBMA) to grow diblock-copolymer brushes of poly(methylmethacrylate-b-t-butyl methacrylate) following the atom transfer polymerization (ATRP) scheme. After the synthesis, deprotection of the PtBMA block yields poly(methacrylic acid) (PMAA). To render PMMA-b-PMAA copolymers photosensitive, cationic azobenzene containing surfactants are attached to the negatively charged outer PMAA block. During irradiation with an ultraviolet (UV) interference pattern, the extent of photoisomerization of the azobenzene groups varies spatially and results in a topography change of the brush, i.e., formation of surface relief gratings (SRG). The SRG formation is accompanied by local rupturing of the polymer chains in areas from which the polymer material recedes. This opto-mechanically induced scission of the polymer chains takes place at the interfaces of the two blocks and depends strongly on the UV irradiation intensity. Our results indicate that this process may be explained by employing classical continuum fracture mechanics, which might be important for tailoring the phenomenon for applying it to poststructuring of polymer brushes.
We report on a change in the properties of monomolecular films of polyelectrolyte molecules, induced by illuminating the silicon substrate on which they adsorb. It was found that under illumination the thickness of the adsorbed layer decreases by at least 27% and at the same time the roughness is significantly reduced in comparison to a layer adsorbed without irradiation. Furthermore, the homogeneity of the film topography and the surface potential is shown to be improved by illumination. The effect is explained by a change in surface charge density under irradiation of n- and p-type silicon wafers. The altered charge density in turn induces conformational changes of the adsorbing polyelectrolyte molecules. Their photocontrolled adsorption opens new possibilities for selective manipulation of adsorbed films. This possibility is of potential importance for many applications such as the production of well-defined coatings in biosensors or microelectronics.
The interface between thin films of metal and polymer materials play a significant role in modern flexible microelectronics viz., metal contacts on polymer substrates, printed electronics and prosthetic devices. The major emphasis in metal polymer interface is on studying how the externally applied stress in the polymer substrate leads to the deformation and cracks in metal film and vice versa. Usually, the deformation process involves strains varying over large lateral dimensions because of excessive stress at local imperfections. Here we show that the seemingly random phenomena at macroscopic scales can be rendered rather controllable at submicrometer length scales. Recently, we have created a metal polymer interface system with strains varying over periods of several hundred nanometers. This was achieved by exploiting the formation of surface relief grating (SRG) within the azobenzene containing photosensitive polymer film upon irradiation with light interference pattern. Up to a thickness of 60 nm, the adsorbed metal film adapts neatly to the forming relief, until it ultimately ruptures into an array of stripes by formation of highly regular and uniform cracks along the maxima and minima of the polymer topography. This surprising phenomenon has far-reaching implications. This is the first time a direct probe is available to estimate the forces emerging in SRG formation in glassy polymers. Furthermore, crack formation in thin metal films can be studied literally in slow motion, which could lead to substantial improvements in the design process of flexible electronics. Finally, cracks are produced uniformly and at high density, contrary to common sense. This could offer new strategies for precise nanofabrication procedures mechanical in character.
In this paper, we report on in-situ atomic force microscopy (AFM) studies of topographical changes in azobenzene-containing photosensitive polymer films that are irradiated with light interference patterns. We have developed an experimental setup consisting of an AFM combined with two-beam interferometry that permits us to switch between different polarization states of the two interfering beams while scanning the illuminated area of the polymer film, acquiring corresponding changes in topography in-situ. This way, we are able to analyze how the change in topography is related to the variation of the electrical field vector within the interference pattern. It is for the first time that with a rather simple experimental approach a rigorous assignment can be achieved. By performing in-situ measurements we found that for a certain polarization combination of two interfering beams [namely for the SP (a dagger center dot, a dagger") polarization pattern] the topography forms surface relief grating with only half the period of the interference patterns. Exploiting this phenomenon we are able to fabricate surface relief structures with characteristic features measuring only 140 nm, by using far field optics with a wavelength of 491 nm. We believe that this relatively simple method could be extremely valuable to, for instance, produce structural features below the diffraction limit at high-throughput, and this could significantly contribute to the search of new fabrication strategies in electronics and photonics industry.
The effect of illumination on the thickness and roughness of monolayers of polycationic molecules of polyethyleneimine deposited from solution onto a silicon substrate was discovered and investigated. The super-bandgap illumination of the substrate during polyethyleneimine adsorption causes a decrease in both the roughness and integral thickness of the organic layer on n- and p-Si substrates.