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Synchrotron-radiation XPS analysis of ultra-thin silane films: Specifying the organic silicon
- The analysis of chemical and elemental in-depth variations in ultra-thin organic layers with thicknesses below 5 nm is very challenging. Energy- and angle-resolved XPS (ER/AR-XPS) opens up the possibility for non-destructive chemical ultra-shallow depth profiling of the outermost surface layer of ultra-thin organic films due to its exceptional surface sensitivity. For common organic materials a reliable chemical in-depth analysis with a lower limit of the XPS information depth z(95) of about 1 nm can be performed. As a proof-of-principle example with relevance for industrial applications the ER/AR-XPS analysis of different organic monolayers made of amino- or benzamidosilane molecules on silicon oxide surfaces is presented. It is demonstrated how to use the Si 2p core-level region to non-destructively depth-profile the organic (silane monolayer) - inorganic (SiO2/Si) interface and how to quantify Si species, ranging from elemental silicon over native silicon oxide to the silane itself. The main advantage of the applied ER/AR-XPSThe analysis of chemical and elemental in-depth variations in ultra-thin organic layers with thicknesses below 5 nm is very challenging. Energy- and angle-resolved XPS (ER/AR-XPS) opens up the possibility for non-destructive chemical ultra-shallow depth profiling of the outermost surface layer of ultra-thin organic films due to its exceptional surface sensitivity. For common organic materials a reliable chemical in-depth analysis with a lower limit of the XPS information depth z(95) of about 1 nm can be performed. As a proof-of-principle example with relevance for industrial applications the ER/AR-XPS analysis of different organic monolayers made of amino- or benzamidosilane molecules on silicon oxide surfaces is presented. It is demonstrated how to use the Si 2p core-level region to non-destructively depth-profile the organic (silane monolayer) - inorganic (SiO2/Si) interface and how to quantify Si species, ranging from elemental silicon over native silicon oxide to the silane itself. The main advantage of the applied ER/AR-XPS method is the improved specification of organic from inorganic silicon components in Si 2p core-level spectra with exceptional low uncertainties compared to conventional laboratory XPS. (C) 2015 Elsevier B.V. All rights reserved.…
Verfasserangaben: | Paul M. Dietrich, Stephan Glamsch, Christopher EhlertORCiDGND, Andreas Lippitz, Nora Kulak, Wolfgang E. S. UngerORCiD |
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DOI: | https://doi.org/10.1016/j.apsusc.2015.12.052 |
ISSN: | 0169-4332 |
ISSN: | 1873-5584 |
Titel des übergeordneten Werks (Englisch): | Applied surface science : a journal devoted to applied physics and chemistry of surfaces and interfaces |
Verlag: | Elsevier |
Verlagsort: | Amsterdam |
Publikationstyp: | Wissenschaftlicher Artikel |
Sprache: | Englisch |
Jahr der Erstveröffentlichung: | 2016 |
Erscheinungsjahr: | 2016 |
Datum der Freischaltung: | 22.03.2020 |
Freies Schlagwort / Tag: | Amides; Amines; Depth profiling; Monolayer; Silanes; Synchrotron radiation XPS |
Band: | 363 |
Seitenanzahl: | 6 |
Erste Seite: | 406 |
Letzte Seite: | 411 |
Fördernde Institution: | European Union through the European Metrology Research Program (EMRP); EMRP participating countries within EURAMET; European Union |
Organisationseinheiten: | Mathematisch-Naturwissenschaftliche Fakultät / Institut für Chemie |
Peer Review: | Referiert |