Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy
- Templates of complex nanopatterns in a form of hierarchically sequenced dots and stripes can be generated in block copolymer films on lithography-free 3D topographic substrates. The approach exploits thickness- and swelling-responsive morphological behavior of block copolymers, and demonstrates novel possibilities of topography-guided registration of nanopatterns due to periodic confinement and spontaneous orthogonal flow-fields.
Author details: | Sungjune Park, Xiao Cheng, Alexander BökerORCiDGND, Larisa Tsarkova |
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DOI: | https://doi.org/10.1002/adma.201601098 |
ISSN: | 0935-9648 |
ISSN: | 1521-4095 |
Pubmed ID: | https://pubmed.ncbi.nlm.nih.gov/27270877 |
Title of parent work (English): | Advanced materials |
Publisher: | Wiley-VCH |
Place of publishing: | Weinheim |
Publication type: | Article |
Language: | English |
Year of first publication: | 2016 |
Publication year: | 2016 |
Release date: | 2020/03/22 |
Volume: | 28 |
Number of pages: | 7 |
First page: | 6900 |
Last Page: | + |
Funding institution: | RWTH Aachen University; CSC |
Organizational units: | Mathematisch-Naturwissenschaftliche Fakultät / Institut für Chemie |
Peer review: | Referiert |