Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy
- Templates of complex nanopatterns in a form of hierarchically sequenced dots and stripes can be generated in block copolymer films on lithography-free 3D topographic substrates. The approach exploits thickness- and swelling-responsive morphological behavior of block copolymers, and demonstrates novel possibilities of topography-guided registration of nanopatterns due to periodic confinement and spontaneous orthogonal flow-fields.
| Author details: | Sungjune Park, Xiao Cheng, Alexander BökerORCiDGND, Larisa Tsarkova |
|---|---|
| DOI: | https://doi.org/10.1002/adma.201601098 |
| ISSN: | 0935-9648 |
| ISSN: | 1521-4095 |
| Pubmed ID: | https://pubmed.ncbi.nlm.nih.gov/27270877 |
| Title of parent work (English): | Advanced materials |
| Publisher: | Wiley-VCH |
| Place of publishing: | Weinheim |
| Publication type: | Article |
| Language: | English |
| Year of first publication: | 2016 |
| Publication year: | 2016 |
| Release date: | 2020/03/22 |
| Volume: | 28 |
| Number of pages: | 7 |
| First page: | 6900 |
| Last Page: | + |
| Funding institution: | RWTH Aachen University; CSC |
| Organizational units: | Mathematisch-Naturwissenschaftliche Fakultät / Institut für Chemie |
| Peer review: | Referiert |
