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Hydrogen permeation, and mechanical and tribological behavior, of CrNx coatings deposited at various bias voltages on IN718 by direct current reactive sputtering

  • In the current work, the microstructure, hydrogen permeability, and properties of chromium nitride (CrNx) thin films deposited on the Inconel 718 superalloy using direct current reactive sputtering are investigated. The influence of the substrate bias voltage on the crystal structure, mechanical, and tribological properties before and after hydrogen exposure was studied. It was found that increasing the substrate bias voltage leads to densification of the coating. X-ray diffraction (XRD) results reveal a change from mixed fcc-CrN + hcp-Cr2N to the approximately stoichiometric hcp-Cr2N phase with increasing substrate bias confirmed by wavelength-dispersive X-ray spectroscopy (WDS). The texture coefficients of (113), (110), and (111) planes vary significantly with increasing substrate bias voltage. The hydrogen permeability was measured by gas-phase hydrogenation. The CrN coating deposited at 60 V with mixed c-CrN and (113) textured hcp-Cr2N phases exhibits the lowest hydrogen absorption at 873 K. It is suggested that the crystalIn the current work, the microstructure, hydrogen permeability, and properties of chromium nitride (CrNx) thin films deposited on the Inconel 718 superalloy using direct current reactive sputtering are investigated. The influence of the substrate bias voltage on the crystal structure, mechanical, and tribological properties before and after hydrogen exposure was studied. It was found that increasing the substrate bias voltage leads to densification of the coating. X-ray diffraction (XRD) results reveal a change from mixed fcc-CrN + hcp-Cr2N to the approximately stoichiometric hcp-Cr2N phase with increasing substrate bias confirmed by wavelength-dispersive X-ray spectroscopy (WDS). The texture coefficients of (113), (110), and (111) planes vary significantly with increasing substrate bias voltage. The hydrogen permeability was measured by gas-phase hydrogenation. The CrN coating deposited at 60 V with mixed c-CrN and (113) textured hcp-Cr2N phases exhibits the lowest hydrogen absorption at 873 K. It is suggested that the crystal orientation is only one parameter influencing the permeation resistance of the CrNx coating together with the film structure, the presence of mixing phases, and the packing density of the structure. After hydrogenation, the hardness increased for all coatings, which could be related to the formation of a Cr2O3 oxide film on the surface, as well as the defect formation after hydrogen loading. Tribological tests reveal that hydrogenation leads to a decrease of the friction coefficient by up to 40%. The lowest value of 0.25 +/- 0.02 was reached for the CrNx coating deposited at 60 V after hydrogenation.zeige mehrzeige weniger

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Metadaten
Verfasserangaben:Egor B. KashkarovORCiD, Aleksei ObrosovORCiD, Alina N. Sutygina, Elena UludintcevaORCiD, Andrei MitrofanovORCiD, Sabine WeißORCiD
URN:urn:nbn:de:kobv:517-opus4-459846
DOI:https://doi.org/10.25932/publishup-45984
ISSN:1866-8372
Titel des übergeordneten Werks (Deutsch):Postprints der Universität Potsdam : Mathematisch Naturwissenschaftliche Reihe
Schriftenreihe (Bandnummer):Zweitveröffentlichungen der Universität Potsdam : Mathematisch-Naturwissenschaftliche Reihe (1017)
Publikationstyp:Postprint
Sprache:Englisch
Datum der Erstveröffentlichung:19.11.2020
Erscheinungsjahr:2018
Veröffentlichende Institution:Universität Potsdam
Datum der Freischaltung:19.11.2020
Freies Schlagwort / Tag:CrNx coatings; Physical Vapour Deposition (PVD); Tribology; X-ray diffraction; hydrogenation; mechanical properties
Ausgabe:1017
Seitenanzahl:14
Quelle:Coatings 8 (2018) 2, 66 DOI: 10.3390/coatings8020066
Organisationseinheiten:Mathematisch-Naturwissenschaftliche Fakultät
DDC-Klassifikation:6 Technik, Medizin, angewandte Wissenschaften / 66 Chemische Verfahrenstechnik / 660 Chemische Verfahrenstechnik
Peer Review:Referiert
Publikationsweg:Open Access / Green Open-Access
Lizenz (Deutsch):License LogoCC-BY - Namensnennung 4.0 International
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