A set of novel zwitterionic side-chain polyacrylates and polymethacrylates is studied by X-ray scattering. The structural order both in the short-range and long-range scale is investigated. The influence of the polymer backbone, of different locations of the ionic groups in isomeric polymers, of bound water and of added inorganic salts on the bulk structures is studied, and the observed rearrangements are analysed.
The molecular packing and spatial correlations of two isomeric zwitterionic polymethacrylates and one polyacrylate analog are studied by means of X-ray analysis and conformational calculations. The analysis of the correlation functions and density distribution profiles suggest a double-layered molecular packing which is discussed for the three polymers investigated, with respect to their different chemical structures. Whereas the zwitterionic polymethacrylates studied exhibit liquid-like short-range order, the polyacrylate analog exhibits an ordered double-layered superstructure.
We discuss the controlled subdiffraction modulations of photosensitive polymer films that are induced by surface plasmon interference in striking contrast to well-known conventional microscopic gratings. The near-field light intensity patterns were generated at the nanoslits fabricated in a silver layer with the photosensitive polymer film placed above. We observed that the topographical modulations can be excited only when the polarization is perpendicular to the nanoslits. Moreover, we have shown that light with certain wavelengths resulted in a characteristic topographical pattern with the periodicity three times smaller than the wavelength of incoming light. A combination of experimental observations with simulations showed that the unique subdiffraction topographical patterns are caused by constructive interference between two counter-propagating surface plasmon waves generated at neighboring nanoslits in the metal layer beneath the photosensitive polymer film. The light intensity distribution was simulated to demonstrate strong dependency upon the slit array periodicity as well as wavelength and polarization of incoming light.