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Photomechanical degrafting of Azo-functionalized Poly(methacrylic acid) (PMAA) brushes

  • We report on the preparation and characterization of photosensitive polymer brushes. The brushes are synthesized through polymer analogous attachment of azobenzene groups to surface-attached poly(methacrylic acid) (PMAA) chains. The topography of the photosensitive brushes shows a strong reaction upon irradiation with UV light. While homogeneous illumination leaves the polymer topography unchanged, irradiation of the samples with interference patterns with periodically varying light intensity leads to the formation of surface relief gratings (SRG). The height of the stripes of the grating can be controlled by adjusting the irradiation time. The SRG pattern can be erased through solvent treatment when the periodicity of the stripe pattern is less than the length of the fully stretched polymer chains. In the opposite case, photomechanical scission of receding polymer chains is observed during SRG formation, and the inscribed patterns are permanent.

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Metadaten
Author:Christian Schuh, Nino Lomadze, Jürgen Rühe, Alexey Kopyshev, Svetlana SanterORCiDGND
DOI:https://doi.org/10.1021/jp2041229
ISSN:1520-6106 (print)
Parent Title (English):The journal of physical chemistry : B, Condensed matter, materials, surfaces, interfaces & biophysical chemistry
Publisher:American Chemical Society
Place of publication:Washington
Document Type:Article
Language:English
Year of first Publication:2011
Year of Completion:2011
Release Date:2017/03/26
Volume:115
Issue:35
Pagenumber:8
First Page:10431
Last Page:10438
Funder:DFG [SA1657/3-1]
Organizational units:Mathematisch-Naturwissenschaftliche Fakultät / Institut für Physik und Astronomie
Peer Review:Referiert