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Light-Induced chain scission in photosensitive polymer brushes

  • We report on a process inducing photomechanical fracture of chemical bonds in photosensitive PMAA polymer brushes. The photosensitive PMAA polymer brushes were prepared by covalent attachment of azobenzene groups to poly(methylacrylic acid) (PMAA) chains generated by surface-initiated polymerization. While homogeneous irradiation leaves the polymer topography unchanged, the azo-PMAA brushes show a strong response upon irradiation with UV interference patterns. The photoisomerization process in the surface-attached polymer films results in the irreversible formation of surface relief gratings (SRG), which are strongly enhanced upon washing with a good solvent for the polymer. The photomechanical forces during mass transport induced by the irradiation lead to the scission of covalent bounds and accordingly to a degrafting of the polymer chains in areas where the polymer is receding from. It is observed that the number of ruptured chains depends strongly on the amount of azo side chains in the polymer.

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Metadaten
Author:Nino Lomadze, Alexey Kopyshev, Jürgen Rühe, Svetlana SanterORCiDGND
DOI:https://doi.org/10.1021/ma201016q
ISSN:0024-9297 (print)
Parent Title (English):Macromolecules : a publication of the American Chemical Society
Publisher:American Chemical Society
Place of publication:Washington
Document Type:Article
Language:English
Year of first Publication:2011
Year of Completion:2011
Release Date:2017/03/26
Volume:44
Issue:18
Pagenumber:6
First Page:7372
Last Page:7377
Funder:DFG [SA1657/3-1]
Organizational units:Mathematisch-Naturwissenschaftliche Fakultät / Institut für Physik und Astronomie
Peer Review:Referiert