TY  - JOUR
A1  - Henneberg, Oliver
A1  - Rochon, Paul
A1  - Panzner, Tobias
A1  - Finkelstein, Kenneth D.
A1  - Geue, Thomas
A1  - Saphiannikova, Marina
A1  - Pietsch, Ullrich
T1  - In-situ Investigation of Surface Relief Grating Formation in Photosensitive Polymers
Y1  - 2004
UR  - http://www.chess.cornell.edu/pubs/csnm2004/research/insitu.pdf
ER  - 
TY  - JOUR
A1  - Pietsch, Ullrich
A1  - Saphiannikova, Marina
A1  - Henneberg, Oliver
A1  - Geue, Thomas
T1  - Non-linear effects during inscription of azobenzene surface relief gratings
Y1  - 2004
ER  - 
TY  - JOUR
A1  - Saphiannikova, Marina
A1  - Henneberg, Oliver
A1  - Gene, T. M.
A1  - Pietsch, Ullrich
A1  - Rochon, Paul
T1  - Nonlinear effects during inscription of azobenzene surface relief gratings
N2  - Surface relief gratings were inscribed on azobenzene polymer films using a pulselike exposure of an Ar+ laser. The inscription process was initiated by a sequence of short pulses followed by much longer relaxation pauses. The development of the surface relief grating was probed by a He-Ne laser measuring the scattering intensity of the first- order grating peak. The growth time of the surface relief grating was found to be larger than the length of the pulses used. This unusual behavior can be considered as a nonlinear material response associated with the trans-cis isomerization of azobenzene moieties. In this study the polymer stress was assumed to be proportional to the number of cis-isomers. One-dimensional viscoelastic analysis was used to derive the polymer deformation. The rate of trans-cis isomerization increases with the intensity of the inscribing light; in the dark it is equal to the rate of thermal cis- trans isomerization. The respective relaxation times were estimated by fitting theoretical deformation curves to experimental data
Y1  - 2004
SN  - 1520-6106
ER  - 
TY  - JOUR
A1  - Henneberg, Oliver
A1  - Geue, Thomas
A1  - Pietsch, Ullrich
A1  - Winter, Bernd
T1  - Investigation of azobenzene side group orientation in polymer surface relief gratings by means of photoelectron spectroscopy
N2  - The molecular orientation of azobenzene side groups in polymer films before (nonpatterned) and after (patterned) development of a surface relief grating has been investigated by photoelectron spectroscopy using synchrotron radiation. The photoemission spectra obtained for 60-100 eV photons of a patterned and a nonpatterned surface are similar when the polarization vector of the synchrotron light is parallel to the grating vector. However, for perpendicular excitation, considerable spectral intensity differences can be observed for 9-14 eV electron binding energy. The observed changes are attributed to the formation of well-oriented azobenzenes at the surface. (C) 2004 American Institute of Physics
Y1  - 2004
UR  - http://scitation.aip.org/journals/doc/APPLAB-ft/vol_84/iss_9/1561_1.html
ER  - 
TY  - JOUR
A1  - Stiller, Burkhard
A1  - Karageorgiev, Peter
A1  - Buchsteiner, Andrea
A1  - Geue, Thomas
A1  - Henneberg, Oliver
A1  - Brehmer, Ludwig
A1  - Natansohn, Almeria
A1  - Hollricher, Olga
T1  - Using light as a tool : optically Induced mass transport generated in Near-Fields
Y1  - 2003
SN  - 0038-7355 -
ER  - 
TY  - JOUR
A1  - Geue, Thomas
A1  - Henneberg, Oliver
A1  - Grenzer, Jörg
A1  - Pietsch, Ullrich
A1  - Natansohn, Almeria
A1  - Rochon, Paul
A1  - Finkelstein, Kenneth D.
T1  - Formation of a buried density grating on thermal erasure of azobenzene polymer surface gratings
Y1  - 2002
SN  - 0927-7757
ER  - 
TY  - JOUR
A1  - Geue, Thomas
A1  - Henneberg, Oliver
A1  - Pietsch, Ullrich
T1  - X-ray reflectivity from sinusoidal surface relief gratings
Y1  - 2002
SN  - 0023-4753
ER  - 
TY  - JOUR
A1  - Henneberg, Oliver
A1  - Pietsch, Ullrich
A1  - Panzner, Tobias
A1  - Geue, Thomas
A1  - Finkelstein, Kenneth D.
T1  - Simultaneous X-ray and visible light diffraction for the investigation of surface relief and density grating formation in azobenzene containing polymer films
N2  - The development of surface relief and density patterns in azobenzene polymer films was studied by diffraction at two different wavelengths. We used x-ray diffraction of synchrotron radiation at 0.124 nm in combination with visible light diffraction at a wavelength of 633 nm. In contrast to visible light scattering x-ray diffraction allows the separation of a surface relief and a density grating contribution due to the different functional dependence of the scattering power. Additionally, the x-ray probe is most sensitive for the onset of the surface grating formation
Y1  - 2006
UR  - http://www.informaworld.com/smpp/title~content=t713644168~db=all
U6  - https://doi.org/10.1080/15421400500383345
SN  - 1542-1406
ER  - 
TY  - JOUR
A1  - Henneberg, Oliver
A1  - Geue, Thomas
A1  - Saphiannikova, Marina
A1  - Pietsch, Ullrich
A1  - Rochon, Paul
A1  - Natansohn, Almeria
T1  - Formation and dynamics of polymer surface relief gratings
Y1  - 2001
SN  - 0378-5963
ER  - 
TY  - JOUR
A1  - Henneberg, Oliver
A1  - Chi, Li Feng
A1  - Geue, Thomas
A1  - Saphiannikova, Marina
A1  - Pietsch, Ullrich
A1  - Rochon, Paul
A1  - Natansohn, Almeria
T1  - Atomic force microscopy inspection of the early state of formation of polymer surface relief grating
Y1  - 2001
ER  -