TY - JOUR A1 - Lomadze, Nino A1 - Kopyshev, Alexey A1 - Bargheer, Matias A1 - Wollgarten, Markus A1 - Santer, Svetlana T1 - Mass production of polymer nano-wires filled with metal nano-particles JF - Scientific reports N2 - Despite the ongoing progress in nanotechnology and its applications, the development of strategies for connecting nano-scale systems to micro-or macroscale elements is hampered by the lack of structural components that have both, nano-and macroscale dimensions. The production of nano-scale wires with macroscale length is one of the most interesting challenges here. There are a lot of strategies to fabricate long nanoscopic stripes made of metals, polymers or ceramics but none is suitable for mass production of ordered and dense arrangements of wires at large numbers. In this paper, we report on a technique for producing arrays of ordered, flexible and free-standing polymer nano-wires filled with different types of nano-particles. The process utilizes the strong response of photosensitive polymer brushes to irradiation with UV-interference patterns, resulting in a substantial mass redistribution of the polymer material along with local rupturing of polymer chains. The chains can wind up in wires of nano-scale thickness and a length of up to several centimeters. When dispersing nano-particles within the film, the final arrangement is similar to a core-shell geometry with mainly nano-particles found in the core region and the polymer forming a dielectric jacket. Y1 - 2017 U6 - https://doi.org/10.1038/s41598-017-08153-0 SN - 2045-2322 VL - 7 SP - 3759 EP - 3764 PB - Nature Publ. Group CY - London ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Lomadze, Nino A1 - Feldman, David A1 - Genzer, Jan A1 - Santer, Svetlana T1 - Making polymer brush photosensitive with azobenzene containing surfactants JF - Polymer : the international journal for the science and technology of polymers N2 - We report on rendering polyelectrolyte brushes photosensitive by loading them with azobenzene-containing cationic surfactants. Planar poly(methacrylic acid) (PMAA) brushes are synthesized using the “grafting from” free-radical polymerization scheme followed by exposure to a solution of photosensitive surfactants consisting of positively-charged head groups and hydrophobic tails into which azobenzene moieties are inserted. In this study the length of the hydrophobic methylene spacer connecting the azobenzene and the charged head group ranges from 4 to 10 CH2 groups. Under irradiation with UV light, the photo-isomerization of azobenzene integrated into a surfactant results in a change in size, geometry, dipole moment and free volume of the whole molecule. When the brush loaded with photosensitive surfactants is exposed to irradiation with UV interference patterns, the topography of the brush deforms following the distribution of the light intensity, exhibiting surface relief gratings (SRG). Since SRG formation is accompanied by a local rupturing of polymer chains in areas from which the polymer material is receding, most of the polymer material is removed from the surface during treatment with good solvent, leaving behind characteristic patterns of lines or dots. The azobenzene molecules still integrated within the polymer film can be removed by washing the brush with water. The remaining nano-structured brush can then be re-used for further functionalization. Although the opto-mechanically induced rupturing occurs for all surfactants, larger species do not penetrate deep enough into the brush such that after rupturing a leftover layer of polymer material remains on the substrate. This indicates that rupturing occurs predominantly in regions of high surfactant density. KW - Azobenzene containing cationic surfactants KW - Photosensitive polymer brushes KW - Opto-mechanically induced scission of polymer chains Y1 - 2015 U6 - https://doi.org/10.1016/j.polymer.2015.09.023 SN - 0032-3861 VL - 79 SP - 65 EP - 72 PB - Elsevier Science CY - Oxford ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Lomadze, Nino A1 - Feldmann, David A1 - Genzer, Jan A1 - Santer, Svetlana T1 - Making polymer brush photosensitive with azobenzene containing surfactants JF - Polymer : the international journal for the science and technology of polymers N2 - We report on rendering polyelectrolyte brushes photosensitive by loading them with azobenzene-containing cationic surfactants. Planar poly( methacrylic acid) (PMAA) brushes are synthesized using the "grafting from" free-radical polymerization scheme followed by exposure to a solution of photosensitive surfactants consisting of positively-charged head groups and hydrophobic tails into which azobenzene moieties are inserted. In this study the length of the hydrophobic methylene spacer connecting the azobenzene and the charged head group ranges from 4 to 10 CH2 groups. Under irradiation with UV light, the photo-isomerization of azobenzene integrated into a surfactant results in a change in size, geometry, dipole moment and free volume of the whole molecule. When the brush loaded with photosensitive surfactants is exposed to irradiation with UV interference patterns, the topography of the brush deforms following the distribution of the light intensity, exhibiting surface relief gratings (SRG). Since SRG formation is accompanied by a local rupturing of polymer chains in areas from which the polymer material is receding, most of the polymer material is removed from the surface during treatment with good solvent, leaving behind characteristic patterns of lines or dots. The azobenzene molecules still integrated within the polymer film can be removed by washing the brush with water. The remaining nano-structured brush can then be re-used for further functionalization. Although the opto-mechanically induced rupturing occurs for all surfactants, larger species do not penetrate deep enough into the brush such that after rupturing a leftover layer of polymer material remains on the substrate. This indicates that rupturing occurs predominantly in regions of high surfactant density. KW - Azobenzene containing cationic surfactants KW - Photosensitive polymer brushes KW - Opto-mechanically induced scission of KW - polymer chains Y1 - 2015 U6 - https://doi.org/10.1016/j.polymer.2015.09.023 SN - 0032-3861 SN - 1873-2291 VL - 79 SP - 65 EP - 72 PB - Elsevier CY - Oxford ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Kanevche, Katerina A1 - Lomadze, Nino A1 - Pfitzner, Emanuel A1 - Loebner, Sarah A1 - Patil, Rohan R. A1 - Genzer, Jan A1 - Heberle, Joachim A1 - Santer, Svetlana T1 - Light-Induced Structuring of Photosensitive Polymer Brushes JF - ACS Applied polymer materials N2 - We investigate light-induced irreversible structuring of surface topographies in poly(3-sulfopropyl methacrylate/potassium salt) (PSPMK) brushes on flat solid substrates prepared by surface-initiated atom transfer radical polymerization. The brushes have been loaded with azobenzene-based surfactant comprised of positively charged headgroups and hydrophobic tail. The surfactant exhibits photoresponsive properties through photoisomerization from the trans to cis states leading to significant changes in physicochemical properties of grafted polymer chains. The azobenzene surfactant enables photoresponsive behavior without introducing irreversible changes to chemical composition of the parent polymer brush. Exposing these photosensitive brushes to irradiation with UV interference beams causes the polymer brush to form surface relief grating (SRG) patterns. The cationic surfactant penetrates only similar to 25% of the upper portion of the PSPMK brush, resulting in the formation of two sections within the brush: a photoresponsive upper layer and nonfunctional buried layer, which is not affected by the UV irradiation. Using nano-FTIR spectroscopy, we characterize locally the chemical composition of the polymer brush and confirm partial penetration of the surfactant within the film. Strong optomechanical stresses take place only within the upper layer of the brush that is impregnated with the surfactants and causes surface topography alternation due to a local rupture of grafted polymer chains. The cleaved polymer chains are then removed from the surface by using a good solvent, leaving behind topographical grating on top of the nonfunctional brush layer. We demonstrate that photostructured polymer brush can be used for reversible switching of brush topography by varying external humidity. KW - photosensitive polymer brushes KW - reversible and irreversible structuring of polymer brushes KW - photosensitive azobenzene containing surfactant KW - strong polyelectrolyte brush KW - SRG formation in polymer brushes Y1 - 2019 U6 - https://doi.org/10.1021/acsapm.9b00705 SN - 2637-6105 VL - 1 IS - 11 SP - 301 EP - 3026 PB - American Chemical Society CY - Washington ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Galvin, Casey J. A1 - Patil, Rohan R. A1 - Genzer, Jan A1 - Lomadze, Nino A1 - Feldmann, David A1 - Zakrevski, Juri A1 - Santer, Svetlana T1 - Light-Induced Reversible Change of Roughness and Thickness of Photosensitive Polymer Brushes JF - Applied physics : A, Materials science & processing N2 - We investigate light-induced changes in thickness and roughness of photosensitive polymer brushes containing azobenzene cationic surfactants by atomic force microscopy (AFM) in real time during light irradiation. Because the cis-state of azobenzene unit requires more free volume than its trans counterpart, the UV light-induced expansion of polymer thin films associated with the trans-to-cis isomerism of azobenzene groups is expected to occur. This phenomenon is well documented in physisorbed polymer films containing azobenzene groups. In contrast, photosensitive polymer brushes show a decrease in thickness under UV irradiation. We have found that the azobenzene surfactants in their trans-state form aggregates within the brush. Under irradiation, the surfactants undergo photoisomerization to the cis-state, which is more hydrophilic. As a consequence, the aggregates within the brush are disrupted, and the polymer brush contracts. When subsequently irradiated with blue light the polymer brush thickness returns back to its initial value. This behavior is related to isomerization of the surfactant to the more hydrophobic trans-state and subsequent formation of surfactant aggregates within the polymer brush. The photomechanical function of the dry polymer brush, i.e., contraction and expansion, was found to be reversible with repeated irradiation cycles and requires only a few seconds for switching. In addition to the thickness change, the roughness of the brush also changes reversibly between a few Angstroms (blue light) and several nanometers (UV light). Photosensitive polymer brushes represent smart films with light responsive thickness and roughness that could be used for generating dynamic fluctuating surfaces, the function of which can be turned on and off in a controllable manner on a nanometer length scale. KW - photosensitive brushes KW - azobenzene containing surfactants KW - light driven reversible change of surface topography and thickness KW - domain memory in polymer brushes KW - orientation of azobenzenes in polymer brushes Y1 - 2016 U6 - https://doi.org/10.1021/acsami.6b06881 SN - 1944-8244 VL - 8 SP - 19175 EP - 19184 PB - American Chemical Society CY - Washington ER - TY - JOUR A1 - Loebner, Sarah A1 - Lomadze, Nino A1 - Kopyshev, Alexey A1 - Koch, Markus A1 - Guskova, Olga A1 - Saphiannikova, Marina A1 - Santer, Svetlana T1 - Light-Induced Deformation of Azobenzene-Containing Colloidal Spheres BT - Calculation and Measurement of Opto-Mechanical Stresses JF - The journal of physical chemistry : B, Condensed matter, materials, surfaces, interfaces & biophysical chemistry N2 - We report on light-induced deformation of colloidal spheres consisting of azobenzene-containing polymers. The colloids of the size between 60 nm and 2 mu m in diameter were drop casted on a glass surface and irradiated with linearly polarized light. It was found that colloidal particles can be deformed up to ca. 6 times of their initial diameter. The maximum degree of deformation depends on the irradiation wavelength and intensity, as well as on colloidal particles size. On the basis of recently proposed theory by Toshchevikov et al. [J. Phys. Chem. Lett. 2017, 8, 1094], we calculated the optomechanical stresses (ca. 100 MPa) needed for such giant deformations and compared them with the experimental results. Y1 - 2018 U6 - https://doi.org/10.1021/acs.jpcb.7b11644 SN - 1520-6106 VL - 122 IS - 6 SP - 2001 EP - 2009 PB - American Chemical Society CY - Washington ER - TY - JOUR A1 - Lomadze, Nino A1 - Kopyshev, Alexey A1 - Rühe, Jürgen A1 - Santer, Svetlana T1 - Light-Induced chain scission in photosensitive polymer brushes JF - Macromolecules : a publication of the American Chemical Society N2 - We report on a process inducing photomechanical fracture of chemical bonds in photosensitive PMAA polymer brushes. The photosensitive PMAA polymer brushes were prepared by covalent attachment of azobenzene groups to poly(methylacrylic acid) (PMAA) chains generated by surface-initiated polymerization. While homogeneous irradiation leaves the polymer topography unchanged, the azo-PMAA brushes show a strong response upon irradiation with UV interference patterns. The photoisomerization process in the surface-attached polymer films results in the irreversible formation of surface relief gratings (SRG), which are strongly enhanced upon washing with a good solvent for the polymer. The photomechanical forces during mass transport induced by the irradiation lead to the scission of covalent bounds and accordingly to a degrafting of the polymer chains in areas where the polymer is receding from. It is observed that the number of ruptured chains depends strongly on the amount of azo side chains in the polymer. Y1 - 2011 U6 - https://doi.org/10.1021/ma201016q SN - 0024-9297 VL - 44 IS - 18 SP - 7372 EP - 7377 PB - American Chemical Society CY - Washington ER - TY - JOUR A1 - Feldmann, David A1 - Arya, Pooja A1 - Lomadze, Nino A1 - Kopyshev, Alexey A1 - Santer, Svetlana T1 - Light-driven motion of self-propelled porous Janus particles JF - Applied physics letters N2 - We introduce a versatile mechanism of light-driven self-propelled motion applied to porous Janus-type particles. The mechanism is based on the generation of local light-driven diffusio-osmotic (l-LDDO) flow around each single porous particle subjected to suitable irradiation conditions. The photosensitivity is introduced by a cationic azobenzene containing surfactant, which undergoes a photoisomerization reaction from a more hydrophobic trans-state to a rather hydrophilic cis-state under illumination with light. The negatively charged porous silica particles are dispersed in a corresponding aqueous solution and absorb molecules in their trans-state but expel them in their cis-state. During illumination with blue light triggering both trans-cis and cis-trans isomerization at the same time, the colloids start to move due to the generation of a steady-state diffusive flow of cis-isomers out of and trans-isomers into the particle. This is because a hemi-spherical metal cap partially sealing the colloid breaks the symmetry of the otherwise radially directed local flow around the particle, leading to self-propelled motion. Janus particles exhibit superdiffusive motion with a velocity of similar to 0.5 mu m/s and a persistence length of ca. 50 mu m, confined to microchannels the direction can be maintained up to 300 mu m before rotational diffusion reverts it. Particles forming dimers of different shapes can be made to travel along circular trajectories. The unique feature of this mechanism is that the strength of self-propulsion can be tuned by convenient external optical stimuli (intensity and irradiation wavelength) such that a broad variety of experimental situations can be realized in a spatiotemporal way and in situ. Y1 - 2019 U6 - https://doi.org/10.1063/1.5129238 SN - 0003-6951 SN - 1077-3118 VL - 115 IS - 26 PB - American Institute of Physics CY - Melville ER - TY - JOUR A1 - Arya, Pooja A1 - Feldmann, David A1 - Kopyshev, Alexey A1 - Lomadze, Nino A1 - Santer, Svetlana T1 - Light driven guided and self-organized motion of mesoporous colloidal particles JF - Soft matter N2 - We report on guided and self-organized motion of ensembles of mesoporous colloidal particles that can undergo dynamic aggregation or separation upon exposure to light. The forces on particles involve the phenomenon of light-driven diffusioosmosis (LDDO) and are hydrodynamic in nature. They can be made to act passively on the ensemble as a whole but also used to establish a mutual interaction between particles. The latter scenario requires a porous colloid morphology such that the particle can act as a source or sink of a photosensitive surfactant, which drives the LDDO process. The interplay between the two modes of operation leads to fascinating possibilities of dynamical organization and manipulation of colloidal ensembles adsorbed at solid-liquid interfaces. While the passive mode can be thought of to allow for a coarse structuring of a cloud of colloids, the inter-particle mode may be used to impose a fine structure on a 2D particle grid. Local flow is used to impose and tailor interparticle interactions allowing for much larger interaction distances that can be achieved with, e.g., DLVO type of forces, and is much more versatile. Y1 - 2019 U6 - https://doi.org/10.1039/c9sm02068c SN - 1744-683X SN - 1744-6848 VL - 16 IS - 5 SP - 1148 EP - 1155 PB - Royal Society of Chemistry CY - Cambridge ER - TY - JOUR A1 - Bekir, Marek A1 - Jelken, Joachim A1 - Jung, Se-Hyeong A1 - Pich, Andrij A1 - Pacholski, Claudia A1 - Kopyshev, Alexey A1 - Santer, Svetlana T1 - Dual responsiveness of microgels induced by single light stimulus JF - Applied physics letters N2 - We report on the multiple response of microgels triggered by a single optical stimulus. Under irradiation, the volume of the microgels is reversibly switched by more than 20 times. The irradiation initiates two different processes: photo-isomerization of the photo-sensitive surfactant, which forms a complex with the anionic microgel, rendering it photo-responsive; and local heating due to a thermo-plasmonic effect within the structured gold layer on which the microgel is deposited. The photo-responsivity is related to the reversible accommodation/release of the photo-sensitive surfactant depending on its photo-isomerization state, while the thermo-sensitivity is intrinsically built in. We show that under exposure to green light, the thermo-plasmonic effect generates a local hot spot in the gold layer, resulting in the shrinkage of the microgel. This process competes with the simultaneous photo-induced swelling. Depending on the position of the laser spot, the spatiotemporal control of reversible particle shrinking/swelling with a predefined extent on a per-second base can be implemented. Y1 - 2021 U6 - https://doi.org/10.1063/5.0036376 SN - 0003-6951 SN - 1077-3118 VL - 118 IS - 9 PB - American Institute of Physics CY - Melville ER - TY - JOUR A1 - Zakrevskyy, Yuriy A1 - Kopyshev, Alexey A1 - Lomadze, Nino A1 - Morozova, Elena A1 - Lysyakova, Liudmila A1 - Kasyanenko, Nina A1 - Santer, Svetlana T1 - DNA compaction by azobenzene-containing surfactant JF - Physical review : E, Statistical, nonlinear and soft matter physics N2 - We report on the interaction of cationic azobenzene-containing surfactant with DNA investigated by absorption and fluorescence spectroscopy, dynamic light scattering, and atomic force microscopy. The properties of the surfactant can be controlled with light by reversible switching of the azobenzene unit, incorporated into the surfactant tail, between a hydrophobic trans (visible irradiation) and a hydrophilic cis (UV irradiation) configuration. The influence of the trans-cis isomerization of the azobenzene on the compaction process of DNA molecules and the role of both isomers in the formation and colloidal stability of DNA-surfactant complexes is discussed. It is shown that the trans isomer plays a major role in the DNA compaction process. The influence of the cis isomer on the DNA coil configuration is rather small. The construction of a phase diagram of the DNA concentration versus surfactant/DNA charge ratio allows distancing between three major phases: colloidally stable and unstable compacted globules, and extended coil conformation. There is a critical concentration of DNA above which the compacted globules can be hindered from aggregation and precipitation by adding an appropriate amount of the surfactant in the trans configuration. This is because of the compensation of hydrophobicity of the globules with an increasing amount of the surfactant. Below the critical DNA concentration, the compacted globules are colloidally stable and can be reversibly transferred with light to an extended coil state. Y1 - 2011 U6 - https://doi.org/10.1103/PhysRevE.84.021909 SN - 1539-3755 VL - 84 IS - 2 PB - American Physical Society CY - College Park ER - TY - JOUR A1 - König, Tobias A1 - Papke, Thomas A1 - Kopyshev, Alexey A1 - Santer, Svetlana T1 - Atomic force microscopy nanolithography fabrication of metallic nano-slits using silicon nitride tips JF - Journal of materials science N2 - In this paper, we report on the properties of nano-slits created in metal thin films using atomic force microscope (AFM) nanolithography (AFM-NL). We demonstrate that instead of expensive diamond AFM tips, it is also possible to use low cost silicon nitride tips. It is shown that depending on the direction of scratching, nano-slits of different widths and depths can be fabricated at constant load force. We elucidate the reasons for this behavior and identify an optimal direction and load force for scratching a gold layer. Y1 - 2013 U6 - https://doi.org/10.1007/s10853-013-7188-x SN - 0022-2461 VL - 48 IS - 10 SP - 3863 EP - 3869 PB - Springer CY - New York ER -