TY  - JOUR
A1  - Pietsch, Ullrich
A1  - Grenzer, Jörg
A1  - Grigorian, Souren A.
A1  - Weyers, Markus
A1  - Zeimer, Ute
A1  - Feranchuk, S.
A1  - Fricke, J.
A1  - Kissel, H.
A1  - Knauer, A.
A1  - Tränkle, G.
T1  - Nanoengineering of lateral strain-modulation in quantum well heterostructures
N2  - We have developed a method to design a lateral band-gap modulation in a quantum well heterostructure. The lateral strain variation is induced by patterning of a stressor layer grown on top of a single quantum well which itself is not patterned. The three-dimensional (3D) strain distribution within the lateral nanostructure is calculated using linear elasticity theory applying a finite element technique. Based on the deformation potential approach the calculated strain distribution is translated into a local variation of the band-gap energy. Using a given vertical layer structure we are able to optimize the geometrical parameters to provide a nanostructure with maximum lateral band-gap variation. Experimentally such a structure was realized by etching a surface grating into a tensile-strained InGaP stressor layer grown on top of a compressively strained InGaAs-single quantum well. The achieved 3D strain distribution and the induced band-gap variation are successfully probed by x-ray grazing incidence diffraction and low-temperature photoluminescence measurements, respectively
Y1  - 2004
ER  - 
TY  - JOUR
A1  - Pietsch, Ullrich
A1  - Zeimer, Ute
A1  - Grenzer, Jörg
A1  - Grigorian, Souren A.
A1  - Fricke, J.
A1  - Gramlich, S.
A1  - Bugge, F.
A1  - Weyers, Markus
A1  - Trankle, G.
T1  - Influence of lateral patterning geometry on lateral carrier confinement in strain-modulated InGaAs- nanostructures
Y1  - 2003
ER  -