TY - JOUR A1 - Jelken, Joachim A1 - Pandiyarajan, Chinnayan Kannan A1 - Genzer, Jan A1 - Lomadze, Nino A1 - Santer, Svetlana T1 - Fabrication of flexible hydrogel sheets featuring periodically spaced circular holes with continuously adjustable size in realtime JF - ACS applied materials & interfaces N2 - We report on the formation of stimuli-responsive structured hydrogel thin films whose pattern geometry can be adjusted on demand and tuned reversibly by varying solvent quality or by changing temperature. The hydrogel films, similar to 100 nm in thickness, were prepared by depositing layers of random copolymers comprising N-isopropylacrylamide and ultraviolet (UV)-active methacryloyloxybenzophenone units onto solid substrates. A two-beam interference pattern technique was used to cross-link the selected areas of the film; any unreacted material was extracted using ethanol after UV light-assisted cross-linking. In this way, we produced nanoholes, perfectly ordered structures with a narrow size distribution, negligible tortuosity, adjustable periodicity, and a high density. The diameter of the circular holes ranged from a few micrometers down to several tens of nanometers; the hole periodicity could be adjusted readily by changing the optical period of the UV interference pattern. The holes were reversibly closed and opened by swelling/deswelling the polymer networks in the presence of ethanol and water, respectively, at various temperatures. The reversible regulation of the hole diameter can be repeated many times within a few seconds. The hydrogel sheet with circular holes periodically arranged may also be transferred onto different substrates and be employed as tunable templates for the deposition of desired substances. KW - photosensitive polymers KW - PNIPAm KW - hydrogels KW - UV cross-linking KW - stimuli-responsive structured polymer films KW - azobenzene-containing molecules Y1 - 2018 U6 - https://doi.org/10.1021/acsami.8b09580 SN - 1944-8244 VL - 10 IS - 36 SP - 30844 EP - 30851 PB - American Chemical Society CY - Washington ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Galvin, Casey J. A1 - Genzer, Jan A1 - Lomadze, Nino A1 - Santer, Svetlana T1 - Opto-mechanical scission of polymer chains in photosensitive diblock-copolymer brushes JF - Langmuir N2 - In this paper we report on an opto-mechanical scission of polymer chains within photosensitive diblock-copolymer brushes grafted to flat solid substrates. We employ surface-initiated polymerization of methylmethacrylate (MMA) and t-butyl methacrylate (tBMA) to grow diblock-copolymer brushes of poly(methylmethacrylate-b-t-butyl methacrylate) following the atom transfer polymerization (ATRP) scheme. After the synthesis, deprotection of the PtBMA block yields poly(methacrylic acid) (PMAA). To render PMMA-b-PMAA copolymers photosensitive, cationic azobenzene containing surfactants are attached to the negatively charged outer PMAA block. During irradiation with an ultraviolet (UV) interference pattern, the extent of photoisomerization of the azobenzene groups varies spatially and results in a topography change of the brush, i.e., formation of surface relief gratings (SRG). The SRG formation is accompanied by local rupturing of the polymer chains in areas from which the polymer material recedes. This opto-mechanically induced scission of the polymer chains takes place at the interfaces of the two blocks and depends strongly on the UV irradiation intensity. Our results indicate that this process may be explained by employing classical continuum fracture mechanics, which might be important for tailoring the phenomenon for applying it to poststructuring of polymer brushes. Y1 - 2013 U6 - https://doi.org/10.1021/la403241t SN - 0743-7463 VL - 29 IS - 45 SP - 13967 EP - 13974 PB - American Chemical Society CY - Washington ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Galvin, Casey J. A1 - Genzer, Jan A1 - Lomadze, Nino A1 - Santer, Svetlana T1 - Polymer brushes modified by photosensitive azobenzene containing polyamines JF - Polymer : the international journal for the science and technology of polymers N2 - This paper describes a strategy for preparing photosensitive polymeric grafts on flat solid surfaces by loading diblock-copolymer or homopolymer brushes with cationic azobenzene-containing surfactants. In contrast to previous work, we utilize photosensitive surfactants that bear positively-charged polyamine head groups whose charge varies between 1(+) and 3(+). Poly(methylmethacrylate-b-methacrylic acid) (PMMA-b-PMAA) brushes were prepared by employing atom transfer radical polymerization, where the bottom poly(methyl methacrylate) block was grown first followed by the synthesis of t-butyl methacrylate block that after de-protection yielded poly(methacrylic acid). We used PMMA-b-PMAA brushes with constant grafting density and length of the PMMA block, and three different lengths of the PMAA block. The azobenzene-based surfactants attached only to the PMAA block. The degree of binding (i.e., the number of surfactant molecules per binding site on the brush backbone) of the surfactants to the brush depends strongly on the valence of the surfactant head-group; within the brushes the concentration of the surfactant carrying unit charge is larger than that of multivalent surfactants. We detect pronounced response of the brush topography on irradiation with UV interference pattern even at very low degree of binding (as small as 0.08) of multi-valence surfactant. Areas on the sample that receive the highest UV dose exhibit chain scission. By removing the ruptured chains from the substrate via good solvent, one uncovers a surface topographical relief grating, whose spatial arrangement follows the intensity distribution of the UV light on the sample during irradiation. Due to strong coupling of the multi-valence surfactants to the polymer brush, it was possible in some cases to completely remove the polyelectrolyte block from the PMMA layer. The application of multi-valence azobenzene surfactants for triggering brush photosensitive has important advantage over usage of surfactant with unit charge because relative to single-valence surfactants much lower concentrations of the multivalent surfactant are needed to achieve comparable response upon UV irradiation. (C) 2016 Elsevier Ltd. All rights reserved. KW - Photosensitive brushes KW - Photosensitive azobenzene containing polyamines Y1 - 2016 U6 - https://doi.org/10.1016/j.polymer.2016.03.050 SN - 0032-3861 SN - 1873-2291 VL - 98 SP - 421 EP - 428 PB - Elsevier CY - Oxford ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Galvin, Casey J. A1 - Patil, Rohan R. A1 - Genzer, Jan A1 - Lomadze, Nino A1 - Feldmann, David A1 - Zakrevski, Juri A1 - Santer, Svetlana T1 - Light-Induced Reversible Change of Roughness and Thickness of Photosensitive Polymer Brushes JF - Applied physics : A, Materials science & processing N2 - We investigate light-induced changes in thickness and roughness of photosensitive polymer brushes containing azobenzene cationic surfactants by atomic force microscopy (AFM) in real time during light irradiation. Because the cis-state of azobenzene unit requires more free volume than its trans counterpart, the UV light-induced expansion of polymer thin films associated with the trans-to-cis isomerism of azobenzene groups is expected to occur. This phenomenon is well documented in physisorbed polymer films containing azobenzene groups. In contrast, photosensitive polymer brushes show a decrease in thickness under UV irradiation. We have found that the azobenzene surfactants in their trans-state form aggregates within the brush. Under irradiation, the surfactants undergo photoisomerization to the cis-state, which is more hydrophilic. As a consequence, the aggregates within the brush are disrupted, and the polymer brush contracts. When subsequently irradiated with blue light the polymer brush thickness returns back to its initial value. This behavior is related to isomerization of the surfactant to the more hydrophobic trans-state and subsequent formation of surfactant aggregates within the polymer brush. The photomechanical function of the dry polymer brush, i.e., contraction and expansion, was found to be reversible with repeated irradiation cycles and requires only a few seconds for switching. In addition to the thickness change, the roughness of the brush also changes reversibly between a few Angstroms (blue light) and several nanometers (UV light). Photosensitive polymer brushes represent smart films with light responsive thickness and roughness that could be used for generating dynamic fluctuating surfaces, the function of which can be turned on and off in a controllable manner on a nanometer length scale. KW - photosensitive brushes KW - azobenzene containing surfactants KW - light driven reversible change of surface topography and thickness KW - domain memory in polymer brushes KW - orientation of azobenzenes in polymer brushes Y1 - 2016 U6 - https://doi.org/10.1021/acsami.6b06881 SN - 1944-8244 VL - 8 SP - 19175 EP - 19184 PB - American Chemical Society CY - Washington ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Kanevche, Katerina A1 - Lomadze, Nino A1 - Pfitzner, Emanuel A1 - Loebner, Sarah A1 - Patil, Rohan R. A1 - Genzer, Jan A1 - Heberle, Joachim A1 - Santer, Svetlana T1 - Light-Induced Structuring of Photosensitive Polymer Brushes JF - ACS Applied polymer materials N2 - We investigate light-induced irreversible structuring of surface topographies in poly(3-sulfopropyl methacrylate/potassium salt) (PSPMK) brushes on flat solid substrates prepared by surface-initiated atom transfer radical polymerization. The brushes have been loaded with azobenzene-based surfactant comprised of positively charged headgroups and hydrophobic tail. The surfactant exhibits photoresponsive properties through photoisomerization from the trans to cis states leading to significant changes in physicochemical properties of grafted polymer chains. The azobenzene surfactant enables photoresponsive behavior without introducing irreversible changes to chemical composition of the parent polymer brush. Exposing these photosensitive brushes to irradiation with UV interference beams causes the polymer brush to form surface relief grating (SRG) patterns. The cationic surfactant penetrates only similar to 25% of the upper portion of the PSPMK brush, resulting in the formation of two sections within the brush: a photoresponsive upper layer and nonfunctional buried layer, which is not affected by the UV irradiation. Using nano-FTIR spectroscopy, we characterize locally the chemical composition of the polymer brush and confirm partial penetration of the surfactant within the film. Strong optomechanical stresses take place only within the upper layer of the brush that is impregnated with the surfactants and causes surface topography alternation due to a local rupture of grafted polymer chains. The cleaved polymer chains are then removed from the surface by using a good solvent, leaving behind topographical grating on top of the nonfunctional brush layer. We demonstrate that photostructured polymer brush can be used for reversible switching of brush topography by varying external humidity. KW - photosensitive polymer brushes KW - reversible and irreversible structuring of polymer brushes KW - photosensitive azobenzene containing surfactant KW - strong polyelectrolyte brush KW - SRG formation in polymer brushes Y1 - 2019 U6 - https://doi.org/10.1021/acsapm.9b00705 SN - 2637-6105 VL - 1 IS - 11 SP - 301 EP - 3026 PB - American Chemical Society CY - Washington ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Lomadze, Nino A1 - Feldman, David A1 - Genzer, Jan A1 - Santer, Svetlana T1 - Making polymer brush photosensitive with azobenzene containing surfactants JF - Polymer : the international journal for the science and technology of polymers N2 - We report on rendering polyelectrolyte brushes photosensitive by loading them with azobenzene-containing cationic surfactants. Planar poly(methacrylic acid) (PMAA) brushes are synthesized using the “grafting from” free-radical polymerization scheme followed by exposure to a solution of photosensitive surfactants consisting of positively-charged head groups and hydrophobic tails into which azobenzene moieties are inserted. In this study the length of the hydrophobic methylene spacer connecting the azobenzene and the charged head group ranges from 4 to 10 CH2 groups. Under irradiation with UV light, the photo-isomerization of azobenzene integrated into a surfactant results in a change in size, geometry, dipole moment and free volume of the whole molecule. When the brush loaded with photosensitive surfactants is exposed to irradiation with UV interference patterns, the topography of the brush deforms following the distribution of the light intensity, exhibiting surface relief gratings (SRG). Since SRG formation is accompanied by a local rupturing of polymer chains in areas from which the polymer material is receding, most of the polymer material is removed from the surface during treatment with good solvent, leaving behind characteristic patterns of lines or dots. The azobenzene molecules still integrated within the polymer film can be removed by washing the brush with water. The remaining nano-structured brush can then be re-used for further functionalization. Although the opto-mechanically induced rupturing occurs for all surfactants, larger species do not penetrate deep enough into the brush such that after rupturing a leftover layer of polymer material remains on the substrate. This indicates that rupturing occurs predominantly in regions of high surfactant density. KW - Azobenzene containing cationic surfactants KW - Photosensitive polymer brushes KW - Opto-mechanically induced scission of polymer chains Y1 - 2015 U6 - https://doi.org/10.1016/j.polymer.2015.09.023 SN - 0032-3861 VL - 79 SP - 65 EP - 72 PB - Elsevier Science CY - Oxford ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Lomadze, Nino A1 - Feldmann, David A1 - Genzer, Jan A1 - Santer, Svetlana T1 - Making polymer brush photosensitive with azobenzene containing surfactants JF - Polymer : the international journal for the science and technology of polymers N2 - We report on rendering polyelectrolyte brushes photosensitive by loading them with azobenzene-containing cationic surfactants. Planar poly( methacrylic acid) (PMAA) brushes are synthesized using the "grafting from" free-radical polymerization scheme followed by exposure to a solution of photosensitive surfactants consisting of positively-charged head groups and hydrophobic tails into which azobenzene moieties are inserted. In this study the length of the hydrophobic methylene spacer connecting the azobenzene and the charged head group ranges from 4 to 10 CH2 groups. Under irradiation with UV light, the photo-isomerization of azobenzene integrated into a surfactant results in a change in size, geometry, dipole moment and free volume of the whole molecule. When the brush loaded with photosensitive surfactants is exposed to irradiation with UV interference patterns, the topography of the brush deforms following the distribution of the light intensity, exhibiting surface relief gratings (SRG). Since SRG formation is accompanied by a local rupturing of polymer chains in areas from which the polymer material is receding, most of the polymer material is removed from the surface during treatment with good solvent, leaving behind characteristic patterns of lines or dots. The azobenzene molecules still integrated within the polymer film can be removed by washing the brush with water. The remaining nano-structured brush can then be re-used for further functionalization. Although the opto-mechanically induced rupturing occurs for all surfactants, larger species do not penetrate deep enough into the brush such that after rupturing a leftover layer of polymer material remains on the substrate. This indicates that rupturing occurs predominantly in regions of high surfactant density. KW - Azobenzene containing cationic surfactants KW - Photosensitive polymer brushes KW - Opto-mechanically induced scission of KW - polymer chains Y1 - 2015 U6 - https://doi.org/10.1016/j.polymer.2015.09.023 SN - 0032-3861 SN - 1873-2291 VL - 79 SP - 65 EP - 72 PB - Elsevier CY - Oxford ER -