TY - JOUR A1 - Titov, Evgenii A1 - Lysyakova, Liudmila A1 - Lomadze, Nino A1 - Kabashin, Andrei V. A1 - Saalfrank, Peter A1 - Santer, Svetlana T1 - Thermal Cis-to-Trans Isomerization of Azobenzene-Containing Molecules Enhanced by Gold Nanoparticles: An Experimental and Theoretical Study JF - The journal of physical chemistry : C, Nanomaterials and interfaces N2 - We report on the experimental and theoretical investigation of a considerable increase in the rate for thermal cis -> trans isomerization of azobenzene-containing molecules in the presence of gold nanopartides. Experimentally, by means of UV vis spectroscopy, we studied a series of azobenzene-containing surfactants and 4-nitroazobenzene. We found that in the presence of gold,nanoparticles the thermal lifetime of the cis isomer of the azobenzenecontaining molecules was decreased by up to 3 orders of magnitude in comparison to the lifetime in solution without nanoparticles. The electron transfer between azobenzene-containing molecules and a surface of gold nanopartides is a possible reason to promote the thermal cis trans switching. To investigate the effect of electron attachment to, and withdrawal from, the azobenzene-containing molecules on the isomerization rate, we performed density functional theory calculations of activation energy barriers of the reaction together with Eyring's transition state theory calculations of the rates for azobenzene derivatives with donor and acceptor groups in para position of one of the phenyl rings, as well as for one of the azobenzene-containing surfactants. We found that activation barriers are greatly lowered for azobenzene-containing molecules, both upon electron attachment and withdrawal, which leads, in turn, to a dramatic increase in the thermal isomerization rate. Y1 - 2015 U6 - https://doi.org/10.1021/acs.jpcc.5b02473 SN - 1932-7447 VL - 119 IS - 30 SP - 17369 EP - 17377 PB - American Chemical Society CY - Washington ER - TY - JOUR A1 - Moradi, N. A1 - Zakrevskyy, Yuriy A1 - Javadi, A. A1 - Aksenenko, E. V. A1 - Fainerman, V. B. A1 - Lomadze, Nino A1 - Santer, Svetlana A1 - Miller, R. T1 - Surface tension and dilation rheology of DNA solutions in mixtures with azobenzene-containing cationic surfactant JF - Colloids and surfaces : an international journal devoted to the principles and applications of colloid and interface science ; A, Physicochemical and engineering aspects N2 - The surface tension and dilational surface visco-elasticity of the individual solutions of the biopolymer DNA and the azobenzene-containing cationic surfactant AzoTAB, as well as their mixtures were measured using the drop profile analysis tensiometry. The negatively charged DNA molecules form complexes with the cationic surfactant AzoTAB. Mixed DNA + AzoTAB solutions exhibit high surface activity and surface layer elasticity. Extremes in the dependence of these characteristics on the AzoTAB concentration exist within the concentration range of 3 x 10(-6)-5 x 10(-5) M. The surface tension of the mixture shows a minimum with a subsequent maximum. In the same concentration range the elasticity shows first a maximum and then a subsequent minimum. A recently developed thermodynamic model was modified to account for the dependence of the adsorption equilibrium constant of the adsorbed complex on the cationic surfactant concentration. This modified theory shows good agreement with the experimental data both for the surface tension and the elasticity values over the entire range of studied AzoTAB concentrations. (C) 2016 Elsevier B.V. All rights reserved. KW - Mixed adsorption layers KW - Polymer/surfactant interaction KW - Water/air interface KW - Thermodynamics of adsorption KW - Dilational rheology KW - Drop profile analysis tensiometry Y1 - 2016 U6 - https://doi.org/10.1016/j.colsurfa.2016.04.021 SN - 0927-7757 SN - 1873-4359 VL - 505 SP - 186 EP - 192 PB - Elsevier CY - Amsterdam ER - TY - JOUR A1 - Yadavalli, Nataraja Sekhar A1 - Saphiannikova, Marina A1 - Lomadze, Nino A1 - Goldenberg, Leonid M. A1 - Santer, Svetlana T1 - Structuring of photosensitive material below diffraction limit using far field irradiation JF - Applied physics : A, Materials science & processing N2 - In this paper, we report on in-situ atomic force microscopy (AFM) studies of topographical changes in azobenzene-containing photosensitive polymer films that are irradiated with light interference patterns. We have developed an experimental setup consisting of an AFM combined with two-beam interferometry that permits us to switch between different polarization states of the two interfering beams while scanning the illuminated area of the polymer film, acquiring corresponding changes in topography in-situ. This way, we are able to analyze how the change in topography is related to the variation of the electrical field vector within the interference pattern. It is for the first time that with a rather simple experimental approach a rigorous assignment can be achieved. By performing in-situ measurements we found that for a certain polarization combination of two interfering beams [namely for the SP (a dagger center dot, a dagger") polarization pattern] the topography forms surface relief grating with only half the period of the interference patterns. Exploiting this phenomenon we are able to fabricate surface relief structures with characteristic features measuring only 140 nm, by using far field optics with a wavelength of 491 nm. We believe that this relatively simple method could be extremely valuable to, for instance, produce structural features below the diffraction limit at high-throughput, and this could significantly contribute to the search of new fabrication strategies in electronics and photonics industry. Y1 - 2013 U6 - https://doi.org/10.1007/s00339-013-7945-3 SN - 0947-8396 SN - 1432-0630 VL - 113 IS - 2 SP - 263 EP - 272 PB - Springer CY - New York ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Galvin, Casey J. A1 - Genzer, Jan A1 - Lomadze, Nino A1 - Santer, Svetlana T1 - Polymer brushes modified by photosensitive azobenzene containing polyamines JF - Polymer : the international journal for the science and technology of polymers N2 - This paper describes a strategy for preparing photosensitive polymeric grafts on flat solid surfaces by loading diblock-copolymer or homopolymer brushes with cationic azobenzene-containing surfactants. In contrast to previous work, we utilize photosensitive surfactants that bear positively-charged polyamine head groups whose charge varies between 1(+) and 3(+). Poly(methylmethacrylate-b-methacrylic acid) (PMMA-b-PMAA) brushes were prepared by employing atom transfer radical polymerization, where the bottom poly(methyl methacrylate) block was grown first followed by the synthesis of t-butyl methacrylate block that after de-protection yielded poly(methacrylic acid). We used PMMA-b-PMAA brushes with constant grafting density and length of the PMMA block, and three different lengths of the PMAA block. The azobenzene-based surfactants attached only to the PMAA block. The degree of binding (i.e., the number of surfactant molecules per binding site on the brush backbone) of the surfactants to the brush depends strongly on the valence of the surfactant head-group; within the brushes the concentration of the surfactant carrying unit charge is larger than that of multivalent surfactants. We detect pronounced response of the brush topography on irradiation with UV interference pattern even at very low degree of binding (as small as 0.08) of multi-valence surfactant. Areas on the sample that receive the highest UV dose exhibit chain scission. By removing the ruptured chains from the substrate via good solvent, one uncovers a surface topographical relief grating, whose spatial arrangement follows the intensity distribution of the UV light on the sample during irradiation. Due to strong coupling of the multi-valence surfactants to the polymer brush, it was possible in some cases to completely remove the polyelectrolyte block from the PMMA layer. The application of multi-valence azobenzene surfactants for triggering brush photosensitive has important advantage over usage of surfactant with unit charge because relative to single-valence surfactants much lower concentrations of the multivalent surfactant are needed to achieve comparable response upon UV irradiation. (C) 2016 Elsevier Ltd. All rights reserved. KW - Photosensitive brushes KW - Photosensitive azobenzene containing polyamines Y1 - 2016 U6 - https://doi.org/10.1016/j.polymer.2016.03.050 SN - 0032-3861 SN - 1873-2291 VL - 98 SP - 421 EP - 428 PB - Elsevier CY - Oxford ER - TY - JOUR A1 - Malyar, Ivan V. A1 - Titov, Evgenii A1 - Lomadze, Nino A1 - Saalfrank, Peter A1 - Santer, Svetlana T1 - Photoswitching of azobenzene-containing self-assembled monolayers as a tool for control over silicon surface electronic properties JF - The journal of chemical physics : bridges a gap between journals of physics and journals of chemistr N2 - We report on photoinduced remote control of work function and surface potential of a silicon surface modified with a photosensitive self-assembled monolayer consisting of chemisorbed azobenzene molecules (4-nitroazobenzene). Itwas found that the attachment of the organic monolayer increases the work function by hundreds of meV due to the increase in the electron affinity of silicon substrates. The change in the work function on UV light illumination is more pronounced for the azobenzene jacketed silicon substrate (ca. 250 meV) in comparison to 50 meV for the unmodified surface. Moreover, the photoisomerization of azobenzene results in complex kinetics of thework function change: immediate decrease due to light-driven processes in the silicon surface followed by slower recovery to the initial state due to azobenzene isomerization. This behavior could be of interest for electronic devices where the reaction on irradiation should be more pronounced at small time scales but the overall surface potential should stay constant over time independent of the irradiation conditions. Published by AIP Publishing. Y1 - 2017 U6 - https://doi.org/10.1063/1.4978225 SN - 0021-9606 SN - 1089-7690 VL - 146 PB - American Institute of Physics CY - Melville ER - TY - JOUR A1 - Zakrevskyy, Yuriy A1 - Roxlau, Julian A1 - Brezesinski, Gerald A1 - Lomadze, Nino A1 - Santer, Svetlana T1 - Photosensitive surfactants: Micellization and interaction with DNA JF - The journal of chemical physics : bridges a gap between journals of physics and journals of chemistr N2 - Recently, photosensitive surfactants have re-attracted considerable attention. It has been shown that their association with oppositely charged biologically important polyelectrolytes, such as DNA or microgels, can be efficiently manipulated simply by light exposure. In this article, we investigate the self-assembly of photosensitive surfactants as well as their interactions with DNA by calorimetric and spectroscopic methods. Critical micelle concentration (CMC), standard micellization enthalpy, entropy, and Gibbs energy were determined in different conditions (ionic strengths and temperatures) for a series of cationic surfactants with an azobenzene group in their tail. It is shown, that aggregation forces of photosensitive units play an important role in the micellization giving the major contribution to the micellization enthalpy. The onset of the aggregation can be traced from shift of the absorption peak position in the UV-visible spectrum. Titration UV-visible spectroscopy is used as an alternative, simple, and sensitive approach to estimate CMC. The titration UV-visible spectroscopy was also employed to investigate interactions (CAC: critical aggregation concentration, precipitation, and colloidal stabilization) in the DNA-surfactant complex. Y1 - 2014 U6 - https://doi.org/10.1063/1.4862678 SN - 0021-9606 SN - 1089-7690 VL - 140 IS - 4 PB - American Institute of Physics CY - Melville ER - TY - JOUR A1 - Schimka, Selina A1 - Lomadze, Nino A1 - Rabe, Maren A1 - Kopyshev, Alexey A1 - Lehmann, Maren A1 - von Klitzing, Regine A1 - Rumyantsev, Artem M. A1 - Kramarenko, Elena Yu. A1 - Santer, Svetlana T1 - Photosensitive microgels containing azobenzene surfactants of different charges JF - Physical chemistry, chemical physics : a journal of European Chemical Societies N2 - We report on light sensitive microgel particles that can change their volume reversibly in response to illumination with light of different wavelengths. To make the anionic microgels photosensitive we add surfactants with a positively charged polyamine head group and an azobenzene containing tail. Upon illumination, azobenzene undergoes a reversible photo-isomerization reaction from a trans- to a cis-state accompanied by a change in the hydrophobicity of the surfactant. Depending on the isomerization state, the surfactant molecules are either accommodated within the microgel (trans- state) resulting in its shrinkage or desorbed back into water (cis-isomer) letting the microgel swell. We have studied three surfactants differing in the number of amino groups, so that the number of charges of the surfactant head varies between 1 and 3. We have found experimentally and theoretically that the surfactant concentration needed for microgel compaction increases with decreasing number of charges of the head group. Utilization of polyamine azobenzene containing surfactants for the light triggered remote control of the microgel size opens up a possibility for applications of light responsive microgels as drug carriers in biology and medicine. Y1 - 2016 U6 - https://doi.org/10.1039/c6cp04555c SN - 1463-9076 SN - 1463-9084 VL - 19 SP - 108 EP - 117 PB - Royal Society of Chemistry CY - Cambridge ER - TY - JOUR A1 - Schuh, Christian A1 - Lomadze, Nino A1 - Rühe, Jürgen A1 - Kopyshev, Alexey A1 - Santer, Svetlana T1 - Photomechanical degrafting of Azo-functionalized Poly(methacrylic acid) (PMAA) brushes JF - The journal of physical chemistry : B, Condensed matter, materials, surfaces, interfaces & biophysical chemistry N2 - We report on the preparation and characterization of photosensitive polymer brushes. The brushes are synthesized through polymer analogous attachment of azobenzene groups to surface-attached poly(methacrylic acid) (PMAA) chains. The topography of the photosensitive brushes shows a strong reaction upon irradiation with UV light. While homogeneous illumination leaves the polymer topography unchanged, irradiation of the samples with interference patterns with periodically varying light intensity leads to the formation of surface relief gratings (SRG). The height of the stripes of the grating can be controlled by adjusting the irradiation time. The SRG pattern can be erased through solvent treatment when the periodicity of the stripe pattern is less than the length of the fully stretched polymer chains. In the opposite case, photomechanical scission of receding polymer chains is observed during SRG formation, and the inscribed patterns are permanent. Y1 - 2011 U6 - https://doi.org/10.1021/jp2041229 SN - 1520-6106 VL - 115 IS - 35 SP - 10431 EP - 10438 PB - American Chemical Society CY - Washington ER - TY - JOUR A1 - Titov, Evgenii A1 - Sharma, Anjali A1 - Lomadze, Nino A1 - Saalfrank, Peter A1 - Santer, Svetlana A1 - Bekir, Marek T1 - Photoisomerization of an azobenzene-containing surfactant within a micelle JF - ChemPhotoChem N2 - Photosensitive azobenzene-containing surfactants have attracted great attention in past years because they offer a means to control soft-matter transformations with light. At concentrations higher than the critical micelle concentration (CMC), the surfactant molecules aggregate and form micelles, which leads to a slowdown of the photoinduced trans -> cis azobenzene isomerization. Here, we combine nonadiabatic dynamics simulations for the surfactant molecules embedded in the micelles with absorption spectroscopy measurements of micellar solutions to uncover the reasons responsible for the reaction slowdown. Our simulations reveal a decrease of isomerization quantum yields for molecules inside the micelles. We also observe a reduction of extinction coefficients upon micellization. These findings explain the deceleration of the trans -> cis switching in micelles of the azobenzene-containing surfactants. KW - azobenzene KW - micelles KW - photoswitches KW - rate constants KW - surfactants KW - surface hopping Y1 - 2021 U6 - https://doi.org/10.1002/cptc.202100103 SN - 2367-0932 VL - 5 IS - 10 SP - 926 EP - 932 PB - Wiley-VCH CY - Weinheim ER - TY - JOUR A1 - Schimka, Selina A1 - Klier, Dennis Tobias A1 - de Guerenu, Anna Lopez A1 - Bastian, Philipp A1 - Lomadze, Nino A1 - Kumke, Michael Uwe A1 - Santer, Svetlana T1 - Photo-isomerization of azobenzene containing surfactants induced by near-infrared light using upconversion nanoparticles as mediator JF - Journal of physics : Condensed matter N2 - Here we report on photo-isomerization of azobenzene containing surfactants induced during irradiation with near-infrared (NIR) light in the presence of upconversion nanoparticles (UCNPs) acting as mediator. The surfactant molecule consists of charged head group and hydrophobic tail with azobenzene group incorporated in alkyl chain. The azobenzene group can be reversible photo-isomerized between two states: trans- and cis- by irradiation with light of an appropriate wavelength. The trans-cis photo-isomerization is induced by UV light, while cis-trans isomerization proceeds either thermally in darkness, or can be accelerated by exposure to illumination with a longer wavelength typically in a blue/green range. We present the application of lanthanide doped UCNPs to successfully switch azobenzene containing surfactants from cis to trans conformation in bulk solution using NIR light. Using Tm-3(+) or Er-3(+) as activator ions, the UCNPs provide emissions in the spectral range of 450 nm < lambda(em) < 480 nm (for Tm-3(+), three and four photon induced emission) or 525 nm < lambda(em) < 545 nm (for Er-3(+), two photon induced emission), respectively. Especially for UCNPs containing Tm-3(+) a good overlap of the emissions with the absorption bands of the azobenzene is present. Under illumination of the surfactant solution with NIR light (lambda(ex) = 976 nm) in the presence of the Tm-3(+)-doped UCNPs, the relaxation time of cis-trans photo-isomerization was increased by almost 13 times compared to thermally induced isomerization. The influence of thermal heating due to the irradiation using NIR light was shown to be minor for solvents not absorbing in NIR spectral range (e.g. CHCl3) in contrast to water, which shows a distinct absorption in the NIR. KW - upconversion nanoparticles KW - azobenzene containing surfactants KW - kinetic of cis-trans isomerization Y1 - 2019 U6 - https://doi.org/10.1088/1361-648X/aafcfa SN - 0953-8984 SN - 1361-648X VL - 31 IS - 12 PB - IOP Publ. Ltd. CY - Bristol ER - TY - JOUR A1 - Sharma, Anjali A1 - Bekir, Marek A1 - Lomadze, Nino A1 - Santer, Svetlana T1 - Photo-Isomerization Kinetics of Azobenzene Containing Surfactant Conjugated with Polyelectrolyte JF - Molecules N2 - Ionic complexation of azobenzene-containing surfactants with any type of oppositely charged soft objects allows for making them photo-responsive in terms of their size, shape and surface energy. Investigation of the photo-isomerization kinetic and isomer composition at a photo-stationary state of the photo-sensitive surfactant conjugated with charged objects is a necessary prerequisite for understanding the structural response of photo-sensitive complexes. Here, we report on photo-isomerization kinetics of a photo-sensitive surfactant in the presence of poly(acrylic acid, sodium salt). We show that the photo-isomerization of the azobenzene-containing cationic surfactant is slower in a polymer complex compared to being purely dissolved in aqueous solution. In a photo-stationary state, the ratio between the trans and cis isomers is shifted to a higher trans-isomer concentration for all irradiation wavelengths. This is explained by the formation of surfactant aggregates near the polyelectrolyte chains at concentrations much lower than the bulk critical micelle concentration and inhibition of the photo-isomerization kinetics due to steric hindrance within the densely packed aggregates. KW - azobenzene KW - photo-sensitive surfactant KW - photo-isomerization kinetics KW - poly (acrylic acid, sodium salt) Y1 - 2020 U6 - https://doi.org/10.3390/molecules26010019 SN - 1420-3049 VL - 29 IS - 1 PB - MDPI CY - Basel ER - TY - JOUR A1 - Zakrevskyy, Yuriy A1 - Titov, Evgenii A1 - Lomadze, Nino A1 - Santer, Svetlana T1 - Phase diagrams of DNA-photosensitive surfactant complexes: Effect of ionic strength and surfactant structure JF - The journal of chemical physics : bridges a gap between journals of physics and journals of chemistr N2 - Realization of all-optically controlled and efficient DNA compaction is the major motivation in the study of interactions between DNA and photosensitive surfactants. In this article, using recently published approach of phase diagram construction [Y. Zakrevskyy, P. Cywinski, M. Cywinska, J. Paasche, N. Lomadze, O. Reich, H.-G. Lohmannsroben, and S. Santer, J. Chem. Phys. 140, 044907 (2014)], a strategy for substantial reduction of compaction agent concentration and simultaneous maintaining the light-induced decompaction efficiency is proposed. The role of ionic strength (NaCl concentration), as a very important environmental parameter, and surfactant structure (spacer length) on the changes of positions of phase transitions is investigated. Increase of ionic strength leads to increase of the surfactant concentration needed to compact DNA molecule. However, elongation of the spacer results to substantial reduction of this concentration. DNA compaction by surfactants with longer tails starts to take place in diluted solutions at charge ratios Z < 1 and is driven by azobenzene-aggregation compaction mechanism, which is responsible for efficient decompaction. Comparison of phase diagrams for different DNA-photosensitive surfactant systems allowed explanation and proposal of a strategy to overcome previously reported limitations of the light-induced decompaction for complexes with increasing surfactant hydrophobicity. (C) 2014 AIP Publishing LLC. Y1 - 2014 U6 - https://doi.org/10.1063/1.4899281 SN - 0021-9606 SN - 1089-7690 VL - 141 IS - 16 PB - American Institute of Physics CY - Melville ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Galvin, Casey J. A1 - Genzer, Jan A1 - Lomadze, Nino A1 - Santer, Svetlana T1 - Opto-mechanical scission of polymer chains in photosensitive diblock-copolymer brushes JF - Langmuir N2 - In this paper we report on an opto-mechanical scission of polymer chains within photosensitive diblock-copolymer brushes grafted to flat solid substrates. We employ surface-initiated polymerization of methylmethacrylate (MMA) and t-butyl methacrylate (tBMA) to grow diblock-copolymer brushes of poly(methylmethacrylate-b-t-butyl methacrylate) following the atom transfer polymerization (ATRP) scheme. After the synthesis, deprotection of the PtBMA block yields poly(methacrylic acid) (PMAA). To render PMMA-b-PMAA copolymers photosensitive, cationic azobenzene containing surfactants are attached to the negatively charged outer PMAA block. During irradiation with an ultraviolet (UV) interference pattern, the extent of photoisomerization of the azobenzene groups varies spatially and results in a topography change of the brush, i.e., formation of surface relief gratings (SRG). The SRG formation is accompanied by local rupturing of the polymer chains in areas from which the polymer material recedes. This opto-mechanically induced scission of the polymer chains takes place at the interfaces of the two blocks and depends strongly on the UV irradiation intensity. Our results indicate that this process may be explained by employing classical continuum fracture mechanics, which might be important for tailoring the phenomenon for applying it to poststructuring of polymer brushes. Y1 - 2013 U6 - https://doi.org/10.1021/la403241t SN - 0743-7463 VL - 29 IS - 45 SP - 13967 EP - 13974 PB - American Chemical Society CY - Washington ER - TY - JOUR A1 - Lomadze, Nino A1 - Kopyshev, Alexey A1 - Bargheer, Matias A1 - Wollgarten, Markus A1 - Santer, Svetlana T1 - Mass production of polymer nanowires filled with metal nanoparticles JF - Scientific reports N2 - Despite the ongoing progress in nanotechnology and its applications, the development of strategies for connecting nano-scale systems to micro- or macroscale elements is hampered by the lack of structural components that have both, nano- and macroscale dimensions. The production of nano-scale wires with macroscale length is one of the most interesting challenges here. There are a lot of strategies to fabricate long nanoscopic stripes made of metals, polymers or ceramics but none is suitable for mass production of ordered and dense arrangements of wires at large numbers. In this paper, we report on a technique for producing arrays of ordered, flexible and free-standing polymer nano-wires filled with different types of nano-particles. The process utilizes the strong response of photosensitive polymer brushes to irradiation with UV-interference patterns, resulting in a substantial mass redistribution of the polymer material along with local rupturing of polymer chains. The chains can wind up in wires of nano-scale thickness and a length of up to several centimeters. When dispersing nano-particles within the film, the final arrangement is similar to a core-shell geometry with mainly nano-particles found in the core region and the polymer forming a dielectric jacket. Y1 - 2017 U6 - https://doi.org/10.1038/s41598-017-08153-0 SN - 2045-2322 VL - 7 PB - Springer Nature CY - London ER - TY - JOUR A1 - Lomadze, Nino A1 - Kopyshev, Alexey A1 - Bargheer, Matias A1 - Wollgarten, Markus A1 - Santer, Svetlana T1 - Mass production of polymer nano-wires filled with metal nano-particles JF - Scientific reports N2 - Despite the ongoing progress in nanotechnology and its applications, the development of strategies for connecting nano-scale systems to micro-or macroscale elements is hampered by the lack of structural components that have both, nano-and macroscale dimensions. The production of nano-scale wires with macroscale length is one of the most interesting challenges here. There are a lot of strategies to fabricate long nanoscopic stripes made of metals, polymers or ceramics but none is suitable for mass production of ordered and dense arrangements of wires at large numbers. In this paper, we report on a technique for producing arrays of ordered, flexible and free-standing polymer nano-wires filled with different types of nano-particles. The process utilizes the strong response of photosensitive polymer brushes to irradiation with UV-interference patterns, resulting in a substantial mass redistribution of the polymer material along with local rupturing of polymer chains. The chains can wind up in wires of nano-scale thickness and a length of up to several centimeters. When dispersing nano-particles within the film, the final arrangement is similar to a core-shell geometry with mainly nano-particles found in the core region and the polymer forming a dielectric jacket. Y1 - 2017 U6 - https://doi.org/10.1038/s41598-017-08153-0 SN - 2045-2322 VL - 7 SP - 3759 EP - 3764 PB - Nature Publ. Group CY - London ER - TY - JOUR A1 - Feldmann, David A1 - Maduar, Salim R. A1 - Santer, Mark A1 - Lomadze, Nino A1 - Vinogradova, Olga I. A1 - Santer, Svetlana T1 - Manipulation of small particles at solid liquid interface: light driven diffusioosmosis JF - Scientific reports N2 - The strong adhesion of sub-micron sized particles to surfaces is a nuisance, both for removing contaminating colloids from surfaces and for conscious manipulation of particles to create and test novel micro/nano-scale assemblies. The obvious idea of using detergents to ease these processes suffers from a lack of control: the action of any conventional surface-modifying agent is immediate and global. With photosensitive azobenzene containing surfactants we overcome these limitations. Such photo-soaps contain optical switches (azobenzene molecules), which upon illumination with light of appropriate wavelength undergo reversible trans-cis photo-isomerization resulting in a subsequent change of the physico-chemical molecular properties. In this work we show that when a spatial gradient in the composition of trans-and cis-isomers is created near a solid-liquid interface, a substantial hydrodynamic flow can be initiated, the spatial extent of which can be set, e.g., by the shape of a laser spot. We propose the concept of light induced diffusioosmosis driving the flow, which can remove, gather or pattern a particle assembly at a solid-liquid interface. In other words, in addition to providing a soap we implement selectivity: particles are mobilized and moved at the time of illumination, and only across the illuminated area. Y1 - 2016 U6 - https://doi.org/10.1038/srep36443 SN - 2045-2322 VL - 6 SP - 25083 EP - 25091 PB - Nature Publ. Group CY - London ER - TY - JOUR A1 - Feldmann, David A1 - Maduar, Salim R. A1 - Santer, Mark A1 - Lomadze, Nino A1 - Vinogradova, Olga I. A1 - Santer, Svetlana T1 - Manipulation of small particles at solid liquid interface BT - light driven diffusioosmosis JF - Scientific reports N2 - The strong adhesion of sub-micron sized particles to surfaces is a nuisance, both for removing contaminating colloids from surfaces and for conscious manipulation of particles to create and test novel micro/nano-scale assemblies. The obvious idea of using detergents to ease these processes suffers from a lack of control: the action of any conventional surface-modifying agent is immediate and global. With photosensitive azobenzene containing surfactants we overcome these limitations. Such photo-soaps contain optical switches (azobenzene molecules), which upon illumination with light of appropriate wavelength undergo reversible trans-cis photo-isomerization resulting in a subsequent change of the physico-chemical molecular properties. In this work we show that when a spatial gradient in the composition of trans- and cis- isomers is created near a solid-liquid interface, a substantial hydrodynamic flow can be initiated, the spatial extent of which can be set, e.g., by the shape of a laser spot. We propose the concept of light induced diffusioosmosis driving the flow, which can remove, gather or pattern a particle assembly at a solid-liquid interface. In other words, in addition to providing a soap we implement selectivity: particles are mobilized and moved at the time of illumination, and only across the illuminated area. KW - genomic DNA conformation KW - photosensitive surfactants KW - optical manipulation KW - photocontrol KW - azobenzene KW - films KW - gradients KW - transport KW - tracking KW - brushes Y1 - 2016 U6 - https://doi.org/10.1038/srep36443 SN - 2045-2322 VL - 6 PB - Nature Publishing Group CY - London ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Lomadze, Nino A1 - Feldman, David A1 - Genzer, Jan A1 - Santer, Svetlana T1 - Making polymer brush photosensitive with azobenzene containing surfactants JF - Polymer : the international journal for the science and technology of polymers N2 - We report on rendering polyelectrolyte brushes photosensitive by loading them with azobenzene-containing cationic surfactants. Planar poly(methacrylic acid) (PMAA) brushes are synthesized using the “grafting from” free-radical polymerization scheme followed by exposure to a solution of photosensitive surfactants consisting of positively-charged head groups and hydrophobic tails into which azobenzene moieties are inserted. In this study the length of the hydrophobic methylene spacer connecting the azobenzene and the charged head group ranges from 4 to 10 CH2 groups. Under irradiation with UV light, the photo-isomerization of azobenzene integrated into a surfactant results in a change in size, geometry, dipole moment and free volume of the whole molecule. When the brush loaded with photosensitive surfactants is exposed to irradiation with UV interference patterns, the topography of the brush deforms following the distribution of the light intensity, exhibiting surface relief gratings (SRG). Since SRG formation is accompanied by a local rupturing of polymer chains in areas from which the polymer material is receding, most of the polymer material is removed from the surface during treatment with good solvent, leaving behind characteristic patterns of lines or dots. The azobenzene molecules still integrated within the polymer film can be removed by washing the brush with water. The remaining nano-structured brush can then be re-used for further functionalization. Although the opto-mechanically induced rupturing occurs for all surfactants, larger species do not penetrate deep enough into the brush such that after rupturing a leftover layer of polymer material remains on the substrate. This indicates that rupturing occurs predominantly in regions of high surfactant density. KW - Azobenzene containing cationic surfactants KW - Photosensitive polymer brushes KW - Opto-mechanically induced scission of polymer chains Y1 - 2015 U6 - https://doi.org/10.1016/j.polymer.2015.09.023 SN - 0032-3861 VL - 79 SP - 65 EP - 72 PB - Elsevier Science CY - Oxford ER - TY - JOUR A1 - Kopyshev, Alexey A1 - Lomadze, Nino A1 - Feldmann, David A1 - Genzer, Jan A1 - Santer, Svetlana T1 - Making polymer brush photosensitive with azobenzene containing surfactants JF - Polymer : the international journal for the science and technology of polymers N2 - We report on rendering polyelectrolyte brushes photosensitive by loading them with azobenzene-containing cationic surfactants. Planar poly( methacrylic acid) (PMAA) brushes are synthesized using the "grafting from" free-radical polymerization scheme followed by exposure to a solution of photosensitive surfactants consisting of positively-charged head groups and hydrophobic tails into which azobenzene moieties are inserted. In this study the length of the hydrophobic methylene spacer connecting the azobenzene and the charged head group ranges from 4 to 10 CH2 groups. Under irradiation with UV light, the photo-isomerization of azobenzene integrated into a surfactant results in a change in size, geometry, dipole moment and free volume of the whole molecule. When the brush loaded with photosensitive surfactants is exposed to irradiation with UV interference patterns, the topography of the brush deforms following the distribution of the light intensity, exhibiting surface relief gratings (SRG). Since SRG formation is accompanied by a local rupturing of polymer chains in areas from which the polymer material is receding, most of the polymer material is removed from the surface during treatment with good solvent, leaving behind characteristic patterns of lines or dots. The azobenzene molecules still integrated within the polymer film can be removed by washing the brush with water. The remaining nano-structured brush can then be re-used for further functionalization. Although the opto-mechanically induced rupturing occurs for all surfactants, larger species do not penetrate deep enough into the brush such that after rupturing a leftover layer of polymer material remains on the substrate. This indicates that rupturing occurs predominantly in regions of high surfactant density. KW - Azobenzene containing cationic surfactants KW - Photosensitive polymer brushes KW - Opto-mechanically induced scission of KW - polymer chains Y1 - 2015 U6 - https://doi.org/10.1016/j.polymer.2015.09.023 SN - 0032-3861 SN - 1873-2291 VL - 79 SP - 65 EP - 72 PB - Elsevier CY - Oxford ER - TY - JOUR A1 - Loebner, Sarah A1 - Yadav, Bharti A1 - Lomadze, Nino A1 - Tverdokhleb, Nina A1 - Donner, Hendrik A1 - Saphiannikova, Marina A1 - Santer, Svetlana T1 - Local direction of optomechanical stress in azobenzene containing polymers during surface relief grating formation JF - Macromolecular materials and engineering N2 - In this work, it is revealed how the photoinduced deformation of azobenzene containing polymers relates to the local direction of optomechanical stresses generated during irradiation with interference patterns (IPs). It can be substantiated by the modeling approach proposed by Saphiannikova et al., which describes the directional photodeformations in glassy side-chain azobenzene polymers, and proves that these deformations arise from the reorientation of rigid backbone segments along the light polarization direction. In experiments and modeling, surface relief gratings in pre-elongated photosensitive colloids of few micrometers length are inscribed using different IPs such as SS, PP, +/- 45, SP, RL, and LR. The deformation of colloidal particles is studied in situ, whereby the local variation of polymer topography is assigned to the local distribution of the electrical field vector for all IPs. Experimentally observed shapes are reproduced exactly with modeling azopolymer samples as visco-plastic bodies in the finite element software ANSYS. Orientation approach correctly predicts local variations of the main axis of light-induced stress in each interference pattern for both initially isotropic and highly oriented materials. With this work, it is suggested that the orientation approach implements a self-sufficient and convincing mechanism to describe photoinduced deformation in azopolymer films that in principle does not require auxiliary assumptions. KW - azobenzene containing polymers KW - colloidal particles KW - direction of optomechanical stress KW - orientation approaches Y1 - 2022 U6 - https://doi.org/10.1002/mame.202100990 SN - 1438-7492 SN - 1439-2054 VL - 307 IS - 8 PB - Wiley-VCH CY - Weinheim ER -