TY  - JOUR
A1  - Koenig, Tobias
A1  - Goldenberg, Leonid M.
A1  - Kulikovska, Olga
A1  - Kulikovsky, Lazar
A1  - Stumpe, Joachim
A1  - Santer, Svetlana
T1  - Reversible structuring of photosensitive polymer films by surface plasmon near field radiation
JF  - Soft matter
N2  - We report on the fabrication and characterisation of a novel type of hybrid azo-modified photosensitive polymer film with a nanoscale metallic structuring integrated into the substrate. The metal structures permit to generate surface plasmon near fields when irradiated by UV-light from the rear without directly illuminating the polymer. This allows establishment of a localized, complex-shape intensity distribution at sub-wavelength resolution with a corresponding impact on the photosensitive polymer. The possibilities of exploiting this setup are manifold. We find that just by using the change of polarization of the incident light as means of control, the topography can be driven to change between various patterns reversibly. These results are confirmed by numerical simulations and compared with in situ recorded topography changes.
Y1  - 2011
U6  - https://doi.org/10.1039/c0sm01164a
SN  - 1744-683X
VL  - 7
IS  - 9
SP  - 4174
EP  - 4178
PB  - Royal Society of Chemistry
CY  - Cambridge
ER  - 
TY  - JOUR
A1  - Koenig, Tobias
A1  - Tsukruk, Vladimir V.
A1  - Santer, Svetlana
T1  - Controlled topography change of subdiffraction structures based on photosensitive polymer films induced by surface plasmon polaritons
JF  - ACS applied materials & interfaces
N2  - We discuss the controlled subdiffraction modulations of photosensitive polymer films that are induced by surface plasmon interference in striking contrast to well-known conventional microscopic gratings. The near-field light intensity patterns were generated at the nanoslits fabricated in a silver layer with the photosensitive polymer film placed above. We observed that the topographical modulations can be excited only when the polarization is perpendicular to the nanoslits. Moreover, we have shown that light with certain wavelengths resulted in a characteristic topographical pattern with the periodicity three times smaller than the wavelength of incoming light. A combination of experimental observations with simulations showed that the unique subdiffraction topographical patterns are caused by constructive interference between two counter-propagating surface plasmon waves generated at neighboring nanoslits in the metal layer beneath the photosensitive polymer film. The light intensity distribution was simulated to demonstrate strong dependency upon the slit array periodicity as well as wavelength and polarization of incoming light.
KW  - azobenzene photosensitive polymer films
KW  - surface plasm on polaritons
KW  - silver nanoslits
Y1  - 2013
U6  - https://doi.org/10.1021/am400712r
SN  - 1944-8244
VL  - 5
IS  - 13
SP  - 6009
EP  - 6016
PB  - American Chemical Society
CY  - Washington
ER  -