@article{BelovaShchukinGorinetal.2011,
  author    = {Belova, Valentina and Shchukin, Dmitry G. and Gorin, Dmitry A. and Kopyshev, Alexey and Moehwald, Helmuth},
  title     = {A new approach to nucleation of cavitation bubbles at chemically modified surfaces},
  series = {Physical chemistry, chemical physics : a journal of European Chemical Societies},
  volume    = {13},
  journal   = {Physical chemistry, chemical physics : a journal of European Chemical Societies},
  number    = {17},
  publisher = {Royal Society of Chemistry},
  address   = {Cambridge},
  issn      = {1463-9076},
  doi       = {10.1039/c1cp20218a},
  pages     = {8015 -- 8023},
  year      = {2011},
  abstract  = {Cavitation at the solid surface normally begins with nucleation, in which defects or assembled molecules located at a liquid-solid interface act as nucleation centers and are actively involved in the evolution of cavitation bubbles. Here, we propose a simple approach to evaluate the behavior of cavitation bubbles formed under high intensity ultrasound (20 kHz, 51.3 W cm (2)) at solid surfaces, based on sonication of patterned substrates with a small roughness (less than 3 nm) and controllable surface energy. A mixture of octadecylphosphonic acid (ODTA) and octadecanethiol (ODT) was stamped on the Si wafer coated with different thicknesses of an aluminium layer (20-500 nm). We investigated the growth mechanism of cavitation bubble nuclei and the evolution of individual pits (defects) formed under sonication on the modified surface. A new activation behavior as a function of Al thickness, sonication time, ultrasonic power and temperature is reported. In this process cooperativity is introduced, as initially formed pits further reduce the energy to form bubbles. Furthermore, cavitation on the patterns is a controllable process, where up to 40-50 min of sonication time only the hydrophobic areas are active nucleation sites. This study provides a convincing proof of our theoretical approach on nucleation.},
  language  = {en}
}
@article{MalyarGorinSanteretal.2013,
  author    = {Malyar, Ivan V. and Gorin, Dmitry A. and Santer, Svetlana and Stetsyura, Svetlana V.},
  title     = {Photocontrolled Adsorption of Polyelectrolyte Molecules on a Silicon Substrate},
  series = {Langmuir},
  volume    = {29},
  journal   = {Langmuir},
  number    = {32},
  publisher = {American Chemical Society},
  address   = {Washington},
  issn      = {0743-7463},
  doi       = {10.1021/1a403838n},
  pages     = {16058 -- 16065},
  year      = {2013},
  abstract  = {We report on a change in the properties of monomolecular films of polyelectrolyte molecules, induced by illuminating the silicon substrate on which they adsorb. It was found that under illumination the thickness of the adsorbed layer decreases by at least 27\% and at the same time the roughness is significantly reduced in comparison to a layer adsorbed without irradiation. Furthermore, the homogeneity of the film topography and the surface potential is shown to be improved by illumination. The effect is explained by a change in surface charge density under irradiation of n- and p-type silicon wafers. The altered charge density in turn induces conformational changes of the adsorbing polyelectrolyte molecules. Their photocontrolled adsorption opens new possibilities for selective manipulation of adsorbed films. This possibility is of potential importance for many applications such as the production of well-defined coatings in biosensors or microelectronics.},
  language  = {en}
}
@article{MalyarGorinSanteretal.2017,
  author    = {Malyar, Ivan V. and Gorin, Dmitry A. and Santer, Svetlana and Stetsyura, Svetlana V.},
  title     = {Photo-assisted adsorption of gold nanoparticles onto a silicon substrate},
  series = {Applied physics letters},
  volume    = {110},
  journal   = {Applied physics letters},
  publisher = {American Institute of Physics},
  address   = {Melville},
  issn      = {0003-6951},
  doi       = {10.1063/1.4979082},
  pages     = {4},
  year      = {2017},
  abstract  = {We report on a photo-assisted adsorption of gold nanoparticles on a silicon substrate studied using atomic-force microscopy and secondary ion mass-spectrometry. Depending on a silicon conductivity type (n-Si or p-Si), the amount of photo-assisted adsorbed gold nanoparticles either increases (n-Si) or decreases (p-Si) on irradiation. In addition, the impacts of a cationic polyelectrolyte monolayer and adsorption time were also revealed. The polyelectrolyte layer enhances the adsorption of the gold nanoparticles but decreases the influence of light. The results of the photo-assisted adsorption on two types of silicon wafer were explained by electron processes at the substrate/solution interface. This work was supported by the German-Russian Interdisciplinary Science Center (G-RISC) funded by the German Federal Foreign Office via the German Academic Exchange Service (DAAD), Project No. P-2014b-1, and Russian foundation for basic research, Project No. 16-08-00524_a.},
  language  = {en}
}