@article{StillerKoepnickMuzikanteetal.1999,
  author    = {Stiller, Burkhard and K{\"o}pnick, Thomas and Muzikante, I. and Neilands, O. and Utinans, M. and Dubrovich, O. and Karageorgiev, Peter and Brehmer, Ludwig},
  title     = {Optically induced switching effect of polymer containing indandione-1,3-pyridinium betaine side chains},
  issn      = {0378-2271},
  year      = {1999},
  language  = {en}
}
@article{ReicheFreydankHelmsetal.1999,
  author    = {Reiche, J{\"u}rgen and Freydank, Anke-Christine and Helms, Andreas and Geue, Thomas and Schulz, Burkhard and Brehmer, Ludwig and Stiller, Burkhard and Knochenhauer, Gerald},
  title     = {Vacuum deposition films of oxadiazole compounds : formation and structure investigation},
  year      = {1999},
  abstract  = {The search for alternative routes of organic thin film formation is stimulated by the outstanding properties of these films in such fields as nonlinear optics, photonic data processing and molecular electronics. The formation of highly ordered multilayer structures by thermal vacuum deposition (VD) of organic compounds is an essential step toward the application of supramolecular organic architectures in technical systems. The VD of an amphiphilic substituted 2,5- diphenylene-1,3,4-oxadiazole 1 onto silicon substrates at defined temperature was used for the formation of ultrathin films. The structural data obtained for the VD-films of oxadiazole 1 by means of X-ray reflectivity, X-ray grazing incidence diffraction and atomic force microscopy (AFM) investigations indicate the formation of well ordered oxadiazole multilayers. The structure of the VD-multilayers is compared with that of Langmuir-Blodgett (LB) films and thermally treated LB-multilayers prepared from the same compound.},
  language  = {en}
}
@article{MahlerRaflerStiller1999,
  author    = {Mahler, J. and Rafler, G. and Stiller, Burkhard},
  title     = {Modified melamines and melamine resins for E/Z-isomerization},
  year      = {1999},
  language  = {en}
}
@article{GustinaMarkavaMuzikanteetal.1999,
  author    = {Gustina, D. and Markava, E. and Muzikante, I. and Stiller, Burkhard and Brehmer, Ludwig},
  title     = {Photoisomerisation process of self-assembled monolayers of some novel azobenzenes},
  year      = {1999},
  language  = {en}
}
@article{BrumaSchulzKoepnicketal.1999,
  author    = {Bruma, Maria and Schulz, Burkhard and K{\"o}pnick, Thomas and Stiller, Burkhard and Mercer, Frank W.},
  title     = {Study of thin films made from aromatic polyamides with silicon and phenylquinoxaline rings in the main chain},
  year      = {1999},
  abstract  = {Aromatic polyamides containing silicon and phenylquinoxaline rings in the main chain have been prepared by polycondensation reaction of a silicon-containing diacid chloride, namely bis(p-chlorocarbonylphenyl) -diphenylsilane, with various aromatic diamines having preformed phenylquinoxaline units. These polymers were easily soluble in polar aprotic solvents, such as N-methylpyrrolidinone (NMP) and dimethylformamide (DMF), and in tetrahydrofurane. They showed high thermal stability with decomposition temperature being above 450°C and glass transition temperature in the range of 253-304°C. Polymer solutions in NMP were processed into thin films having the thickness of tens of nanometer to 10 mm, by spin-coating onto glass plates or silicon wafers. The films had strong adhesion to substrates and exhibited very smooth surfaces, free of pinholes, in atomic force microscopy (AFM) studies. The free-standing films had dielectric constant in the range of 3.48-3.69. Thermal treatment of the films up to 350°C rendered them completely insoluble in organic solvents, while maintaining their smoothness and strong adhesion to the silicon substrate, and with no Tg in DSC experiments. Their FTIR spectra did not show any changes compared to the untreated films, meaning that polymers maintain their structural integrity at high temperature. {\´O} 1999 Elsevier Science S.A. All rights reserved.},
  language  = {en}
}
@article{BrumaSchulzKoepnicketal.1999,
  author    = {Bruma, Maria and Schulz, Burkhard and K{\"o}pnick, Thomas and Stiller, Burkhard and Belomoina, Nataliya and Mercer, Frank W.},
  title     = {Synthesis and study of aromatic polyamides containing silicon and phenylquinoxaline rings in the main chain},
  year      = {1999},
  abstract  = {New poly(phenylquinoxaline-amide)s with silicon in the main chain have been prepared by polycondensation reaction of a diacid chloride, namely bis(p-chlorocarbonyl-phenyl)-diphenylsilane, with aromatic diamines containing one or two phenylquinoxaline rings separated by a flexible bridge such as ether or methylene. These polymers were easily soluble in polar aprotic solvents such as N-methylpyrrolidinone (NMP) and dimethylformamide (DMF) and showed high thermal stability with decomposition temperature being above 450°C and glass transition temperature in the range of 260- 304°C. Polymer solutions in NMP were processed into thin flexible films which exhibited very smooth surfaces, free of pinholes when studied by atomic force microscopy. The free-standing films showed a dielectric constant in the range of 3.6-3.7.},
  language  = {en}
}
@article{BrumaHamciucSchulzetal.1999,
  author    = {Bruma, Maria and Hamciuc, Elena and Schulz, Burkhard and K{\"o}pnick, Thomas and Stiller, Burkhard and Mercer, Frank W.},
  title     = {Synthesis of fluorinated poly(phenylquinoxaline-amide)s and study of thin films made therefrom},
  year      = {1999},
  abstract  = {A series of five fluorinated poly(phenylquinoxaline-amide)s were synthesized by a polycondensation reaction of a diacid chloride containing the hexafluoroisopropylidene (6F) group, namely 2,2-bis(p-chlorocarbonylphenyl)- hexafluoropropane, with various aromatic diamines incorporating two phenyl-substituted quinoxaline rings. These polymers were easily soluble in polar aprotic solvents such as N-methylpyrrolione (NMP), dimethylformamide (DMF), and tetrahydrofurane (THF), and showed a high thermal stability with decomposition temperatures above 400 °C and glass transition temperatures in the range of 260-290 Tg. Polymer solutions in NMP were processed into free-standing films that showed low dielectric constant values, in the range of 3.4-3.9, and good mechanical properties, with tensile strength in the range of 40-80 MPa and elongation to break in the range of 22-55\%. Very thin films, in the range of tens of nanometer, which were deposited onto silicon wafers exhibited very smooth surfaces, free of pinholes when studied by atomic force microscopy (AFM).},
  language  = {en}
}