@article{ParkChengBoekeretal.2016,
  author    = {Park, Sungjune and Cheng, Xiao and B{\"o}ker, Alexander and Tsarkova, Larisa},
  title     = {Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy},
  series = {Advanced materials},
  volume    = {28},
  journal   = {Advanced materials},
  publisher = {Wiley-VCH},
  address   = {Weinheim},
  issn      = {0935-9648},
  doi       = {10.1002/adma.201601098},
  pages     = {6900 -- +},
  year      = {2016},
  abstract  = {Templates of complex nanopatterns in a form of hierarchically sequenced dots and stripes can be generated in block copolymer films on lithography-free 3D topographic substrates. The approach exploits thickness- and swelling-responsive morphological behavior of block copolymers, and demonstrates novel possibilities of topography-guided registration of nanopatterns due to periodic confinement and spontaneous orthogonal flow-fields.},
  language  = {en}
}