@article{YadavalliSanter2013, author = {Yadavalli, Nataraja Sekhar and Santer, Svetlana}, title = {In-situ atomic force microscopy study of the mechanism of surface relief grating formation in photosensitive polymer films}, series = {Journal of applied physics}, volume = {113}, journal = {Journal of applied physics}, number = {22}, publisher = {American Institute of Physics}, address = {Melville}, issn = {0021-8979}, doi = {10.1063/1.4809640}, pages = {12}, year = {2013}, abstract = {When photosensitive azobenzene-containing polymer films are irradiated with light interference patterns, topographic variations in the film develop that follow the local distribution of the electric field vector. The exact correspondence of e.g., the vector orientation in relation to the presence of local topographic minima or maxima is in general difficult to determine. Here, we report on a systematic procedure how this can be accomplished. For this, we devise a new set-up combining an atomic force microscope and two-beam interferometry. With this set-up, it is possible to track the topography change in-situ, while at the same time changing polarization and phase of the impinging interference pattern. This is the first time that an absolute correspondence between the local distribution of electric field vectors and the local topography of the relief grating could be established exhaustively. Our setup does not require a complex mathematical post-processing and its simplicity renders it interesting for characterizing photosensitive polymer films in general.}, language = {en} } @article{YadavalliLindeKopyshevetal.2013, author = {Yadavalli, Nataraja Sekhar and Linde, Felix and Kopyshev, Alexey and Santer, Svetlana}, title = {Soft matter beats hard matter - rupturing of thin metallic films induced by mass transport in photosensitive polymer films}, series = {ACS applied materials \& interfaces}, volume = {5}, journal = {ACS applied materials \& interfaces}, number = {16}, publisher = {American Chemical Society}, address = {Washington}, issn = {1944-8244}, doi = {10.1021/am4006132w}, pages = {7743 -- 7747}, year = {2013}, abstract = {The interface between thin films of metal and polymer materials play a significant role in modern flexible microelectronics viz., metal contacts on polymer substrates, printed electronics and prosthetic devices. The major emphasis in metal polymer interface is on studying how the externally applied stress in the polymer substrate leads to the deformation and cracks in metal film and vice versa. Usually, the deformation process involves strains varying over large lateral dimensions because of excessive stress at local imperfections. Here we show that the seemingly random phenomena at macroscopic scales can be rendered rather controllable at submicrometer length scales. Recently, we have created a metal polymer interface system with strains varying over periods of several hundred nanometers. This was achieved by exploiting the formation of surface relief grating (SRG) within the azobenzene containing photosensitive polymer film upon irradiation with light interference pattern. Up to a thickness of 60 nm, the adsorbed metal film adapts neatly to the forming relief, until it ultimately ruptures into an array of stripes by formation of highly regular and uniform cracks along the maxima and minima of the polymer topography. This surprising phenomenon has far-reaching implications. This is the first time a direct probe is available to estimate the forces emerging in SRG formation in glassy polymers. Furthermore, crack formation in thin metal films can be studied literally in slow motion, which could lead to substantial improvements in the design process of flexible electronics. Finally, cracks are produced uniformly and at high density, contrary to common sense. This could offer new strategies for precise nanofabrication procedures mechanical in character.}, language = {en} } @article{YadavalliSaphiannikovaLomadzeetal.2013, author = {Yadavalli, Nataraja Sekhar and Saphiannikova, Marina and Lomadze, Nino and Goldenberg, Leonid M. and Santer, Svetlana}, title = {Structuring of photosensitive material below diffraction limit using far field irradiation}, series = {Applied physics : A, Materials science \& processing}, volume = {113}, journal = {Applied physics : A, Materials science \& processing}, number = {2}, publisher = {Springer}, address = {New York}, issn = {0947-8396}, doi = {10.1007/s00339-013-7945-3}, pages = {263 -- 272}, year = {2013}, abstract = {In this paper, we report on in-situ atomic force microscopy (AFM) studies of topographical changes in azobenzene-containing photosensitive polymer films that are irradiated with light interference patterns. We have developed an experimental setup consisting of an AFM combined with two-beam interferometry that permits us to switch between different polarization states of the two interfering beams while scanning the illuminated area of the polymer film, acquiring corresponding changes in topography in-situ. This way, we are able to analyze how the change in topography is related to the variation of the electrical field vector within the interference pattern. It is for the first time that with a rather simple experimental approach a rigorous assignment can be achieved. By performing in-situ measurements we found that for a certain polarization combination of two interfering beams [namely for the SP (a dagger center dot, a dagger") polarization pattern] the topography forms surface relief grating with only half the period of the interference patterns. Exploiting this phenomenon we are able to fabricate surface relief structures with characteristic features measuring only 140 nm, by using far field optics with a wavelength of 491 nm. We believe that this relatively simple method could be extremely valuable to, for instance, produce structural features below the diffraction limit at high-throughput, and this could significantly contribute to the search of new fabrication strategies in electronics and photonics industry.}, language = {en} } @article{LindeYadavalliSanter2013, author = {Linde, Felix and Yadavalli, Nataraja Sekhar and Santer, Svetlana}, title = {Conductivity behavior of very thin gold films ruptured by mass transport in photosensitive polymer film}, series = {APPLIED PHYSICS LETTERS}, volume = {103}, journal = {APPLIED PHYSICS LETTERS}, number = {25}, publisher = {AMER INST PHYSICS}, address = {MELVILLE}, issn = {0003-6951}, doi = {10.1063/1.4850595}, pages = {4}, year = {2013}, abstract = {We report on conductivity behavior of very thin gold layer deposited on a photosensitive polymer film. Under irradiation with light interference pattern, the azobenzene containing photosensitive polymer film undergoes deformation at which topography follows a distribution of intensity, resulting in the formation of a surface relief grating. This process is accompanied by a change in the shape of the polymer surface from flat to sinusoidal together with a corresponding increase in surface area. The gold layer placed above deforms along with the polymer and ruptures at a strain of 4\%. The rupturing is spatially well defined, occurring at the topographic maxima and minima resulting in periodic cracks across the whole irradiated area. We have shown that this periodic micro-rupturing of a thin metal film has no significant impact on the electrical conductivity of the films. We suggest a model to explain this phenomenon and support this by additional experiments where the conductivity is measured in a process when a single nanoscopic scratch is formed with an AFM tip. Our results indicate that in flexible electronic materials consisting of a polymer support and an integrated metal circuit, nano-and micro cracks do not alter significantly the behavior of the conductivity unless the metal is disrupted completely. (C) 2013 AIP Publishing LLC.}, language = {en} }