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Sensitivity and fading of irradiated RADFETs with different gate voltages

  • The radiation-sensitive field-effect transistors (RADFETs) with an oxide thickness of 400 nm are irradiated with gate voltages of 2, 4 and 6 V, and without gate voltage. A detailed analysis of the mechanisms responsible for the creation of traps during irradiation is performed. The creation of the traps in the oxide, near and at the silicon/silicon-dioxide (Si/SiO2) interface during irradiation is modelled very well. This modelling can also be used for other MOS transistors containing SiO2. The behaviour of radiation traps during postirradiation annealing is analysed, and the corresponding functions for their modelling are obtained. The switching traps (STs) do not have significant influence on threshold voltage shift, and two radiation-induced trap types fit the fixed traps (FTs) very well. The fading does not depend on the positive gate voltage applied during irradiation, but it is twice lower in case there is no gate voltage. A new dosimetric parameter, called the Golden Ratio (GR), is proposed, which represents theThe radiation-sensitive field-effect transistors (RADFETs) with an oxide thickness of 400 nm are irradiated with gate voltages of 2, 4 and 6 V, and without gate voltage. A detailed analysis of the mechanisms responsible for the creation of traps during irradiation is performed. The creation of the traps in the oxide, near and at the silicon/silicon-dioxide (Si/SiO2) interface during irradiation is modelled very well. This modelling can also be used for other MOS transistors containing SiO2. The behaviour of radiation traps during postirradiation annealing is analysed, and the corresponding functions for their modelling are obtained. The switching traps (STs) do not have significant influence on threshold voltage shift, and two radiation-induced trap types fit the fixed traps (FTs) very well. The fading does not depend on the positive gate voltage applied during irradiation, but it is twice lower in case there is no gate voltage. A new dosimetric parameter, called the Golden Ratio (GR), is proposed, which represents the ratio between the threshold voltage shift after irradiation and fading after spontaneous annealing. This parameter can be useful for comparing MOS dosimeters.show moreshow less

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Author details:Goran S. RisticORCiD, Stefan D. Ilic, Marko S. Andjelkovic, Russell Duane, Alberto J. Palma, Antonio M. Lalena, Miloš KrstićORCiDGND, Aleksandar B. Jaksic
DOI:https://doi.org/10.1016/j.nima.2022.166473
ISSN:0168-9002
ISSN:1872-9576
Title of parent work (English):Nuclear Instruments and Methods in Physics Research Section A
Publisher:Elsevier
Place of publishing:Amsterdam
Publication type:Article
Language:English
Date of first publication:2022/04/11
Publication year:2022
Release date:2024/06/10
Tag:RADFETs; annealing; fading; irradiation; pMOS radiation dosimeter; sensitivity
Volume:1029
Article number:166473
Number of pages:7
Funding institution:European Union [857558]; Ministry of Education, Science and; Technological Development of the Republic of Serbia [43011]
Organizational units:Mathematisch-Naturwissenschaftliche Fakultät / Institut für Informatik und Computational Science
DDC classification:0 Informatik, Informationswissenschaft, allgemeine Werke / 00 Informatik, Wissen, Systeme / 000 Informatik, Informationswissenschaft, allgemeine Werke
Peer review:Referiert
Publishing method:Open Access / Hybrid Open-Access
License (German):License LogoCC-BY - Namensnennung 4.0 International
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